Effects of magnesium film thickness and annealing temperature on formation of Mg 2 Si films on silicon (1 1 1) substrate deposited by magnetron sputtering

Applied Surface Science

Volumn 257, Issue 17, 2011, Pages 7800-7804

  Xiao, Qingquan ^a   Xie, Quan ^a   Shen, Xiangqian ^a   Zhang, Jinmin ^a   Yu, Zhiqiang ^a   Zhao, Kejie ^a  

^a GUIZHOU UNIVERSITY   (China)

Author keywords

Annealing; Diffusion; Magnesium silicide; Scanning electron microscopy; Thin film; X ray diffraction

Indexed keywords

ANNEALING; DIFFUSION; FILM THICKNESS; MAGNESIA; MAGNETRON SPUTTERING; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SILICIDES; SILICON; SUBSTRATES; X RAY DIFFRACTION;

ANNEALING FURNACE; ANNEALING TEMPERATURES; HIGH QUALITY; MAGNESIUM SILICIDES; MAGNETRON SPUTTERING METHOD; POLYCRYSTALLINE; POLYCRYSTALLINE FILM; SEM IMAGE;

THIN FILMS;

EID: 79957460407     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.04.032     Document Type: Article

References (26)

1. V. Borisenko Semiconducting Silicides 2000 Springer New York
2. R. Morris, R. Redin, and G. Danielson Phys. Rev. 109 1958 1909
3. J. Mahan, A. Vantomme, G. Langouche, and J. Becker Phys. Rev. B 54 1996 16965
4. M. Yoshinaga, T. Iida, M. Noda, T. Endo, and Y. Takanashi Thin Solid Films 461 2004 86
5. R. Saravanan, and M. Robert J. Alloy. Compd. 479 2009 26
6. A. Vantomme, G. Langouche, J. Mahan, and J. Becker Microelectron. Eng. 50 2000 237
7. S. Song, K. Striebel, X. Song, and E. Cairns J. Power Sources 119 2003 110
8. N.G. Galkin, S.V. Vavanova, A.M. Maslov, K.N. Galkin, A.V. Gerasimenko, and T.A. Kaidalova Thin Solid Films 515 2007 8230
9. T. Hosono, M. Kuramoto, Y. Matsuzawa, Y. Momose, Y. Maeda, T. Matsuyama, H. Tatsuoka, Y. Fukuda, S. Hashimoto, and H. Kuwabara Appl. Surf. Sci. 216 2003 620
10. N. Takagi, Y. Sato, T. Matsuyama, H. Tatsuoka, M. Tanaka, C. Fengmin, and H. Kuwabara Appl. Surf. Sci. 244 2005 330
11. T. Serikawa, M. Henmi, T. Yamaguchi, H. Oginuma, and K. Kondoh Surf. Coat. Technol. 200 2006 4233
12. T. Serikawa, M. Henmi, T. Yamaguchi, H. Oginuma, and K. Kondoh J. Jpn. Inst. Met. 69 2005 31
13. Y. Yang, and Q. Xie J. Mater. Sci. 44 2009 3877
14. J. Zhang, Q. Xie, P. Yu, Q. Xiao, Y. Zhang, Z. Yang, and Y. Liang Thin Solid Films 516 2008 8625
15. Z. Yu, Q. Xie, Q. Xiao, and K. Zhao Acta Phys. Sin-Ch. Ed. 58 2009 6889
16. Q. Chen, Q. Xie, W. Yan, C. Yang, and F. Zhao Sci. Chin. 38 2008 825
17. N. Galkin Thin Solid Films 515 2007 8179
18. X.N. Wang, Y. Wang, J. Zou, T.C. Zhang, Z.X. Mei, and G. Yang Chin. Phys. B 18 2009 3079
19. J.i. Tani, M. Takahashi, and HiroyasuKido J. Alloy. Compd. 488 2009 346
20. H.Y. Jiang, Y.G. Leng, and L.M. Zhang J. Wuhan Univ. Tech. 23 2001 7
21. A. Zur, and T.C. McGill J. Appl. Phys. 55 1984 378
22. A. Zur, T.C. McGill, and M.A. Nicolet J. Appl. Phys. 57 1985 600
23. K. Wasa, M. Kitabatake, and H. Adachi Thin Film Materials Technology: Sputtering of Compound Materials 2004 William Andrew
24. S. Dey, and S.J. Yun Appl. Surf. Sci. 143 1999 191
25. J.A. Thornton, J. Tabock, and D. Hoffman Thin Solid Films 64 1979 111
26. T. Serikawa, M. Henmi, and K. Kondoh J. Vac. Sci. Technol. A 22 2004 1971