Formation of CaMgSi at Ca 2 Si/Mg 2 Si interface

Applied Surface Science

Volumn 216, Issue 1-4 SPEC., 2003, Pages 620-624

  Hosono, T ^a   Kuramoto, M ^a   Matsuzawa, Y ^a   Momose, Y ^a   Maeda, Y ^b   Matsuyama, T ^c   Tatsuoka, H ^a   Fukuda, Y ^a   Hashimoto, S ^d   Kuwabara, H ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b Osaka Prefecture University   (Japan)

^c Pulstec Industrial Co Ltd   (Japan)

^d Kokan Keisoku KK   (Japan)

Author keywords

A1 diffusion; A1 interfaces; A1 surface processes; B2 semiconducting silicon compounds

Indexed keywords

CALCIUM COMPOUNDS; COMPOSITION; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACIAL MORPHOLOGY;

INTERFACES (MATERIALS);

EID: 0038746893     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00471-9     Document Type: Conference Paper

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