Preparation of α-FeSi2 by laser annealing

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8625-8628

  Zhang, Jinmin ^a   Xie, Quan ^a   Yu, Ping ^a   Xiao, Qingquan ^a   Zhang, Yong ^a   Yang, Ziyi ^a   Liang, Yan ^a  

^a GUIZHOU UNIVERSITY   (China)

Author keywords

Laser annealing; Magnetron sputtering; Scanning electron microscopy; X ray diffraction

Indexed keywords

LASERS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SILICON;

DIRECT CURRENT MAGNETRON SPUTTERING; DIRECT FORMATION; FE FILMS; LASER ANNEALING; LASER ENERGIES; PULSED LASERS; SCANNING ELECTRON MICROSCOPY; SI(100); X-RAY DIFFRACTION;

MAGNETRON SPUTTERING;

EID: 50849141674     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.06.048     Document Type: Article

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