Formation of Mg-Si thin film deposited by ion beam sputtering

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 69, Issue 1, 2005, Pages 31-35

  Serikawa, Tadashi ^a   Henmi, Momoko ^b   Yamaguchi, Takashi ^a   Oginuma, Hideki ^a   Kondoh, Katsuyoshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b Gifu Pref Sci/Technol Prom Ctr   (Japan)

Author keywords

Amorphous; Ion beam sputtering; Low substrate temperature; Magnesium suicide (Mg 2Si) thin films

Indexed keywords

AMORPHOUS; ION BEAM SPUTTERING; LOW SUBSTRATE TEMPERATURE; MAGNESIUM SILICIDE (MG2SI) THIN FILMS;

AMORPHOUS MATERIALS; ELASTIC MODULI; EVAPORATION; HARDNESS; ION BEAMS; MAGNESIUM ALLOYS; MAGNESIUM COMPOUNDS; SEMICONDUCTOR MATERIALS; SPUTTERING; SUBSTRATES; THERMAL EFFECTS;

THIN FILMS;

EID: 14844340293     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet.69.31     Document Type: Article

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