Depositions and microstructures of Mg-Si thin film by ion beam sputtering

Surface and Coatings Technology

Volumn 200, Issue 14-15, 2006, Pages 4233-4239

  Serikawa, T ^a   Henmi, M ^a   Yamaguchi, T ^b   Oginuma, H ^a   Kondoh, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b Gifu Sci/Technology Prom Center   (Japan)

Author keywords

Intermetallic compound; Ion beam sputtering; Low substrate temperature; Magnesium silicide (Mg2Si); Mg Si thin films

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELASTIC MODULI; ELECTRIC PROPERTIES; HARDNESS; INTERMETALLICS; ION BEAM ASSISTED DEPOSITION; MAGNESIUM PRINTING PLATES; SILICON; SPUTTER DEPOSITION;

ION BEAM SPUTTERING; LOW SUBSTRATE TEMPERATURE; MAGNESIUM SILICIDE THIN FILMS;

THIN FILMS;

CRYSTAL MICROSTRUCTURE; ELASTIC MODULI; ELECTRIC PROPERTIES; HARDNESS; INTERMETALLICS; ION BEAM ASSISTED DEPOSITION; MAGNESIUM PRINTING PLATES; SILICON; SPUTTER DEPOSITION; THIN FILMS;

EID: 33644758301     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.047     Document Type: Article

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