Fabrication of oxidation-resistant β-FeSi2 film on Mg2Si by RF magnetron-sputtering deposition

Journal of Alloys and Compounds

Volumn 488, Issue 1, 2009, Pages 346-349

  Tani, Jun ichi ^a   Takahashi, Masanari ^a   Kido, Hiroyasu ^a  

^a OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

Intermetallics; Kinetics; Oxidation; Scanning electron microscopy; SEM; X ray diffraction

Indexed keywords

AFTER-HEAT TREATMENT; AVRAMI EXPONENT; DIFFUSION CONTROLLED REACTIONS; IN-VACUUM; JOHNSON MEHL AVRAMI EQUATION; OXIDATION RESISTANT; OXIDE LAYER; POST ANNEALING; REACTION TEMPERATURE; RF MAGNETRONS; SEM;

DIFFRACTION; INTERMETALLICS; MAGNETRONS; OXIDATION; OXYGEN; SCANNING ELECTRON MICROSCOPY; VACUUM DEPOSITION; X RAY DIFFRACTION;

SILICON;

EID: 70449590041     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.08.128     Document Type: Article

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