Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template

Optics Letters

Volumn 32, Issue 21, 2007, Pages 3125-3127

  Hong, Young Rae ^a   Asakawa, Koji ^b   Adamson, Douglas H ^a   Chaikin, Paul M ^c   Register, Richard A ^c  

^a Princeton University   (United States)

^b TOSHIBA CORPORATION   (Japan)

^c POLYTECHNIC UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH PLASMA FREQUENCY; SILICON NANOWIRE GRID POLARIZER;

NANOWIRES; POLYSTYRENES; REACTIVE ION ETCHING; SHEAR BANDS; SILICON;

BLOCK COPOLYMERS;

EID: 40149109374     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.32.003125     Document Type: Article

References (13)