Nanoscratch study of ZnO thin films deposited using radio frequency magnetron sputtering

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 269, Issue 12, 2011, Pages 1450-1454

  Yau, Wei Hung ^a   Tseng, Pai Chung ^a   Lian, Derming ^b  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b NATIONAL CHIN YI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

AFM; Nanoscratch; r.f. Magnetron sputtering; XRD; Zinc oxide (ZnO)

Indexed keywords

ADSORBED OXYGEN; AFM; CHEMICAL COMPOSITIONS; COEFFICIENT OF FRICTIONS; COLUMNAR STRUCTURES; DEPOSITION POWER; GROWING FILMS; GROWTH ORIENTATIONS; IN-SITU; LANGASITES; NANO-SCRATCH; R.F. MAGNETRON SPUTTERING; RADIO FREQUENCY MAGNETRON SPUTTERING; RADIO-FREQUENCY MAGNETRON SPUTTERING SYSTEM; SCANNING ELECTRON MICROSCOPY IMAGE; SPUTTERING RATE; STRUCTURAL DEFECT; SURFACE LAYERS; XRD; ZNO; ZNO FILMS; ZNO THIN FILM;

DEPOSITION; ION BOMBARDMENT; MAGNETRON SPUTTERING; METALLIC FILMS; NANOTECHNOLOGY; OXYGEN; PHOTOELECTRON SPECTROSCOPY; RADIO; RADIO WAVES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 79955554184     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.03.009     Document Type: Article

References (28)

1. S.A. Studenikin, N. Golego, and M. Cocivera J. Appl. Phys. 84 1998 2287
2. X.D. Li, L. Zhang, and H. Gao J. Phys. D: Appl. Phys. 37 2004 753
3. S.J. Bull J. Phys. D: Appl. Phys. 38 2005 R393
4. C.H. Chien, S.R. Jian, C.T. Wang, J.Y. Juang, J.C. Huang, and Y.S. Lai J. Phys. D: Appl. Phys. 40 2007 3985
5. V.A. Coleman, J.E. Bradby, C. Jagadish, P. Munroe, Y.W. Heo, S.J. Pearton, D.P. Norton, M. Inoue, and M. Yano Appl. Phys. Lett. 86 2005 203105
6. S. Zhao, Y. Zhou, Y. Liu, K. Zhao, S. Wang, W. Xiang, Z. Liu, P. Han, Z. Zhang, Z. Chen, H. Lu, K. Jin, B. Cheng, and G. Yang Appl. Surf. Sci. 253 2006 726
7. R. Navamathavan, K.K. Kim, D.K. Hwang, S.J. Park, T.G. Lee, G.S. Kim, and J.H. Hahn Mater. Lett. 61 2007 2443
8. S.R. Jian, I.J. Teng, P.F. Yang, Y.S. Lai, J.M. Lu, J.G. Chang, and S.P. Ju Nanoscale. Res. Lett. 3 2008 186
9. J.J. Chen, Y. Gao, F. Zeng, D.M. Li, and F. Pan Appl. Surf. Sci. 223 2004 318
10. L.Y. Lin, M.C. Jeong, D.E. Kim, and J.M. Myoung Surf. Coat. Technol. 201 2006 2547
11. H. Schulz, and K.H. Thiemann Solid State Commun. 32 1979 783
12. P.F. Yang, H.C. Wen, Y.S. Lai, C.T. Wang, S. Wu, and R.S. Chen Microelectron. Reliab. 48 2008 389
13. W.T. Lim, and C.H. Lee Thin Solid Films 353 1999 12
14. S.S. Lin, J.L. Huang, and D.F. Lii Surf. Coat. Technol. 176 2004 173
15. J.W. Shin, J.Y. Lee, T.W. Kim, Y.S. No, W.J. Cho, and W.K. Choi Appl. Phys. Lett. 88 2006 091911
16. J.M. Yuk, J.Y. Lee, J.H. Jung, T.W. Kim, D.I. Son, and W.K. Choi Appl. Phys. Lett. 90 2007 031907
17. K.B. Sundaram, and A. Khan Thin Solid Films 295 1997 87
18. Y.M. Lu, W.S. Hwang, W.Y. Liu, and J.S. Yang Mater. Chem. Phys. 72 2001 269
19. N. Almqvist Surf. Sci. 355 1996 221
20. S.V. Prasad, S.D. Walck, and J.S. Zabinski Thin Solid Films 360 2000 107
21. Chao, S.J. Lin, and W.C. Chang Nucl. Instr. Meth. B 268 2010 1581
22. L. Shen, Z.Q. Ma, C. Shen, and F. Li Nucl. Instr. Meth. B 268 2010 2679
23. Md Nurul Islam, T.B. Ghosh, K.L. Chopra, and H.N. Acharya Thin Solid Films 280 1996 20
24. S. Komuro, T. Katsumata, T. Morikawa, X. Zhao, H. Isshiki, and Y. Aoyagi J. Appl. Phys. 88 2000 7129
25. M. Futsuhara, K. Yoshioka, and O. Takai Thin Solid Films 322 1998 274
26. Z.B. Gu, M.H. Lu, J. Wang, D. Wu, S.T. Zhang, X.K. Meng, Y.Y. Zhu, S.N. Zhu, and Y.F. Chen Appl. Phys. Lett. 88 2006 082111
27. J.B. Lee, H.J. Kim, S.G. Kim, C.S. Hwang, S.H. Hong, Y.H. Shin, and N.H. Lee Thin Solid Films 435 2003 179
28. Y.M. Lu, W.S. Hwang, W.Y. Liu, and J.S. Yang Mater. Chem. Phys. 72 2001 269