The mechanism of the oxygen-tuned morphology of Al-doped ZnO films prepared by pulsed-laser ablation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 17-18, 2010, Pages 2679-2682

  Shen, Ling ^a   Ma, Zhong Quan ^a   Shen, Cheng ^a   Li, Feng ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

EDS; PLD; SEM; XRD; ZnO

Indexed keywords

AL-DOPED ZNO; FUSED QUARTZ; HIGH QUALITY; INFLUENCE OF OXYGEN; OXYGEN PRESSURE; PULSED LASER ABLATION; SEM; SMOOTH SURFACE; XRD; ZNO;

ABLATION; DEPOSITION; FILM THICKNESS; GLASS LASERS; METALLIC FILMS; METALLIC GLASS; MORPHOLOGY; OPTICAL FILMS; OXIDE MINERALS; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; QUARTZ; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

ALUMINUM;

EID: 77955515862     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2010.06.002     Document Type: Article

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