AFM nanopatterning of transition metal oxide thin films

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 7, 2010, Pages 4471-4476

  Pellegrino, L ^a   Pallecchi, I ^a   Bellinger, E ^a   Canu, G ^a   Siri, A S ^a   Marre D ^a   Yanagisawa, Y ^b   Ishikawa, M ^b   Matsumoto, T ^b   Tanaka, H ^b   Kawai, T ^b  

^a UNIVERSITY OF GENOA   (Italy)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Local Anodic Oxidation; Nanolithography; Oxide

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPES; DIVERSE METHODS; FURTHER DEVELOPMENT; INSULATING FILM; LOCAL ANODIC OXIDATION; METHYL METHACRYLATES; MULTISTEP PROCESS; NANOMASKS; NANOPATTERNING; PATTERNING TRANSITION; SELECTIVE WET ETCHING; TRANSITION-METAL OXIDES;

ATOMIC FORCE MICROSCOPY; DRY ETCHING; FABRICATION; MOLYBDENUM; NANOLITHOGRAPHY; OXIDE FILMS; PLASMA ETCHING; THIN FILMS; TRANSITION METAL COMPOUNDS; TRANSITION METALS; WET ETCHING;

ANODIC OXIDATION;

EID: 79955443874     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2363     Document Type: Conference Paper

References (29)

1. J. A. Dagata. F. Perez-Murano. G. Abadal, K. Morimoto. T. Inoue. J. ltoh. and H. Yokoyama. Appl. Phys. Lett. 76. 2710 (2000), and references therein.
2. R. Garcia. M. Calleja. and H. Rohrer. J. Appl. Phys. 86. 1898 (1999).
3. S. Gómez-Moñivas. J. J. Sáenz. M. Calleja, and R. García, Phys. Rev. Lett. 91. 056101 (2003).
4. J. A. Dagata. F. Perez-Murano, C. Martin, H. Kuramochi. and H. Yokoyama.J. Appl. Phys. 96. 2386 (2004).
5. J. A. Dagata. F. Perez- Murano. C. Martin, H. Kuramochi. and H. Yokoyama.J. Appl. Phys. 96 2393 (2004).
6. A. A. Tseng, A. Notargiacomo, T. P. Chen. J. Vac. Sci. Teclmol. B 2.3. 877 (2005). and references therein.
7. R. García. R. V. Martinez, and J. Martinez, Chem. Soc. Rev. 35. 29 (2006). and references therein.
8. A. Takagi, Ph.D. thesis. University of Geneva (2000).
9. Ø. Dahl, S. Hallsteinsen, J. K. Grepstad. A. Borg, and T. Tybell, Mat. Res. Soc. Symp. Proc. 81 1, E 4.2.1 (2004).
10. G. Bertsche. W. Clauss, F. E. Prins, and D. P. Kern. J. Vac. Sci. Teclmol. B 165. 2833 (1998).
11. I. Song, B. M. Kim. and G. Park. Appl. Phys. Lett. 76. 601 (2000).
12. R. Kostecki and F. McLarnon, Appl. Phys. Lett. 76, 2535 (2000).
13. L. Pellegrino, I. Pallecchi, D. Marre, E. Bellingeri, and A. S. Siri, Appl. Phys. Lett. 81. 3849 (2002)
14. L. Pellegrino, E. Bellingeri, I. Pallecchi. A. S. Siri, D. Marre, Solid State Electronics 47, 2193 (2003).
15. I. Pallecchi, L. Pellegrino, E. Bellingeri, A. S. Siri, and D. Marre, Phys. Rev. B 71, 014406 (2005).
16. Y Yanagisawa, H. Tanaka, and T. Kawai, and L. Pellegrino, Appl. Phys. Lett. 89, 253121 (2006).
17. I. Pallecchi, L. Pellegrino, E. Bellingeri, A. S. Siri, and D. Marré, Appl. Phys. Lett. 94, 4435 (2003)
18. I. Pallecchi, L. Pellegrino, E. Bellingeri, A. S. Siri, and D. Marré, J. Appl. Phys. 95, 8079 (2004).
19. M. Ishikawa, H. Tanaka, and T. Kawai, Appl. Phys. Lett. 86, 222504 (2005).
20. Autoprobe CP5 from Park Scientific Instruments®, now Veeco Instruments Inc.; Veeco Digital Instruments. DI3I00: NT-MDT Solver P47; AFM images were processed by WSxM © from Nanotec Electronica S. L. http:J./www.nanotec.es.
21. 2C coated Si tips (0.12 N/m).
22. M. Hirooka, Y. Yanagisawa, T. Kanki, H. Tanaka, and T. Kawai, Appl. Phys. Lett. 89, 163113 (2006)
23. R. W. Li, T. Kanki, H. Tohyama, J. Zhang, H. Tanaka, A. Takagi, T. Matsumoto, and T. Kawai, J. Appl. Phys. 95, 7091 (2004)
24. R.-W. Li, T. Kanki, H.-A. Tohyama, M. Hirooka, H. Tanaka, and T Kawai, Nanotechnology 16, 28 (2005).
25. Y Yanagisawa, M. Hirooka, H. Tanaka, and T Kawai, J. Appl. Phys. 100, 124316 (2006).
26. R.-W. Li, T Kanki, M. Hirooka, A. Takagi, T Matsumoto, H. Tanaka, and T. Kawai, Appl. Phys. Lett. 84, 2670 (2004).
27. L. Pellegrino, E. Bellingeri, A. S. Siri, and D. Marré, Appl. Phys. Lett. 87,064102 (2005).
28. M. Rolandi, C. F. Quate, and H. Dai, Adv. Mater. 14, 191 (2002).
29. L. Pellegrino, Y Yanagisawa, M. Ishikawa, T. Matsumoto, H. Tanaka, and T. Kawai, Adv. Mater. 18, 3099 (2006).