Nanoscale patterning of (La,Pr,Ca) Mn O3 thin film using atomic force microscopy lithography and their electrical properties

Journal of Applied Physics

Volumn 100, Issue 12, 2006, Pages

  Yanagisawa, Yoshihiko ^a   Hirooka, Motoyuki ^a   Tanaka, Hidekazu ^a   Kawai, Tomoji ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; LITHOGRAPHY; MANGANESE COMPOUNDS; NANOSTRUCTURED MATERIALS; PHASE SEPARATION;

ELECTRONIC PHASE SEPARATION; ION MIGRATION; METAL INSULATOR TRANSITION TEMPERATURE; NANOCHANNELS;

THIN FILMS;

EID: 33846090187     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2402031     Document Type: Article

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