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Volumn 18, Issue 23, 2006, Pages 3099-3104

(Fe,Mn)3O4 nanochannels fabricated by AFM local-oxidation nanolithography using Mo/poly(methyl methacrylate) nanomasks

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; ATOMIC FORCE MICROSCOPY; ETCHING; FERROMAGNETISM; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; OXIDATION; POLYMETHYL METHACRYLATES;

EID: 33846160143     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200600997     Document Type: Article
Times cited : (35)

References (41)
  • 5
    • 33846162381 scopus 로고    scopus 로고
    • APBs are spontaneous defects occurring during film growth due to different nucleation configurations
    • APBs are spontaneous defects occurring during film growth due to different nucleation configurations.
  • 37
    • 33846123065 scopus 로고    scopus 로고
    • We do not know if a few clusters of Mo are left on the FMO surface; however, this fact might not be critical for most applications
    • We do not know if a few clusters of Mo are left on the FMO surface; however, this fact might not be critical for most applications.
  • 38
    • 33846146788 scopus 로고    scopus 로고
    • Although Mo and MoO3 features can be removed using a KI/I 2/H2O solution, modification of FMO regions under the biased AFM tip cannot be excluded, preventing the use of the same area for successive device fabrication
    • 2O solution, modification of FMO regions under the biased AFM tip cannot be excluded, preventing the use of the same area for successive device fabrication.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.