High-voltage nanoimprint lithography of metal films refractory

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 7, 2010, Pages 4423-4433

  Farkas, N ^a   Ramsier, R D ^b   Dagata, J A ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF AKRON   (United States)

Author keywords

Metal Nitride Thin Films; Nanoimprint Lithography; Scanning Probe Microscopy

Indexed keywords

FUNCTIONAL NANOSTRUCTURES; FUNDAMENTAL PRINCIPLES; GROWTH PROCESS; HIGH-VOLTAGES; LOCAL OXIDATION; MAGNETIC APPLICATIONS; METAL FILM; METAL OXIDATION; METAL THIN FILM; NANO-IMPRINTING; NITRIDE THIN FILMS; POLYMER SURFACES; SELECTIVE ETCHING; SINGLE CRYSTAL SILICON;

FILM GROWTH; FUNCTIONAL POLYMERS; GROWTH KINETICS; METALLIC FILMS; METALS; NITRIDES; OXIDATION; PROBES; REFRACTORY METALS; SCANNING; SCANNING PROBE MICROSCOPY; THIN FILMS;

NANOIMPRINT LITHOGRAPHY;

EID: 79955379914     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2351     Document Type: Conference Paper

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