Characterization of zirconium nitride films sputter deposited with an extensive range of nitrogen flow rates

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 2, 2008, Pages 297-301

  Farkas, N ^a   Zhang, G ^b   Ramsier, R D ^a   Evans, E A ^b   Dagata, J A ^c  

^a UNIVERSITY OF AKRON   (United States)

^b University of Akron   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DECORATIVE COATINGS; NITROGEN FLOW RATES; SCANNED PROBE MICROSCOPE; ZIRCONIUM NITRIDE FILMS;

FLOW RATE; MAGNETRON SPUTTERING; NITROGEN; SPUTTER DEPOSITION; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

THIN FILMS;

EID: 40249106120     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2839856     Document Type: Article

References (21)