Chemical nanoimprint lithography for step-and-repeat Si patterning

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2321-2324

  Namatsu, Hideo ^a   Oda, Masatoshi ^a   Yokoo, Atsushi ^b   Fukuda, Makoto ^c   Irisa, Koichi ^d   Tsurumi, Shigeyuki ^d   Komatsu, Kazuhiko ^a  

^a NTT Advance Technology Corporation   (Japan)

^b NTT Basic Research Laboratories   (Japan)

^c HIROSAKI UNIVERSITY   (Japan)

^d Musashi Engineering Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; HUMIDITY CONTROL; SILICON; SILICON CARBIDE;

CHEMICAL NANOIMPRINT LITHOGRAPHY; ELECTROCHEMICAL REACTIONS; PRESSURE ADJUSTMENT SYSTEMS;

NANOIMPRINT LITHOGRAPHY;

ELECTROCHEMISTRY; HUMIDITY CONTROL; LITHOGRAPHY; SILICON; SILICON CARBIDE;

EID: 37149044102     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2806970     Document Type: Article

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