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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 3, 2011, Pages

Structure and properties of nanocrystalline ZrNxOy thin films: Effect of the oxygen content and film thickness

(4) Lan, Kuan Che a Hunag, Jia Hong a Ai, Chi Fong b Yu, Ge Ping a,c

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b INSTITUTE OF NUCLEAR ENERGY RESEARCH (Taiwan)

c Institute of Nuclear Engineering and Science (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL AND MECHANICAL PROPERTIES; ELECTRICAL RESISTIVITY; HOLLOW CATHODE DISCHARGE ION PLATINGS; MICROSTRUCTURE CHANGES; NANOCRYSTALLINES; OXYGEN CONTENT; OXYGEN FLOW RATES; SI (100) SUBSTRATE; STRUCTURE AND PROPERTIES; THICKNESS DEPENDENCE; XRD;

ELECTRIC CONDUCTIVITY; ION IMPLANTATION; MECHANICAL PROPERTIES; OXYGEN; PHASE SEPARATION; RESIDUAL STRESSES; THIN FILMS; X RAY DIFFRACTION; ZIRCONIUM ALLOYS;

FILM THICKNESS;

EID: 79955146015 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3565487 Document Type: Article

Times cited : (5)

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