Physical properties evolution of sputtered zirconium oxynitride films: Effects of the growth temperature

Journal of Physics D: Applied Physics

Volumn 42, Issue 23, 2009, Pages

  Rizzo, A ^a   Signore, M A ^a   Mirenghi, L ^a   Piscopiello, E ^a   Tapfer, L ^a  

^a ENEA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION TECHNIQUES; CUBIC PHASE; DEPOSITION TEMPERATURES; DISPERSION EQUATIONS; NITROGEN ATMOSPHERES; OPTICAL ANALYSIS; OPTICAL PARAMETER; OVER-STOICHIOMETRIC; OXYNITRIDE FILMS; OXYNITRIDES; RF REACTIVE MAGNETRON SPUTTERING; STRUCTURAL TRANSITIONS; SUBSTRATE TEMPERATURE; TEM; TEM OBSERVATIONS; WATER VAPOUR; XPS SPECTRA; ZIRCONIUM NITRIDE;

ATMOSPHERIC TEMPERATURE; CHEMICAL PROPERTIES; LIGHT TRANSMISSION; NITRIDES; OPTICAL PROPERTIES; PHASE TRANSITIONS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; WATER ANALYSIS; WATER VAPOR; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70450174212     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/23/235401     Document Type: Article

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