Isopropanol/water as a developer for poly(dimethylglutarimide)

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 7, Issue 4, 2008, Pages

  Johnstone, Robert W ^a   Foulds, Ian G ^a   Pallapa, Manu V ^a   Parameswaran, Ash M ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Deep UV; Developer; Dissolution; Isopropanol; Photoresist; Poly(dimethylglutarimide)

Indexed keywords

AMMONIUM COMPOUNDS; PHOTORESISTS; QUANTUM OPTICS;

BI-LAYER; DEEP UV; DEVELOPER; EXPOSURE DOSE; IMAGING APPLICATIONS; ISO-PROPANOLS; ISOPROPANOL; POLY(DIMETHYLGLUTARIMIDE); RADIATION SOURCE; TETRAETHYLAMMONIUM; TETRAMETHYL AMMONIUM HYDROXIDE; TRILAYERS;

DISSOLUTION;

EID: 79953027873     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2990738     Document Type: Article

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