PMMA as an X-ray resist for micro-machining application: Latent image formation and thickness losses

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 543-546

  Vladimirsky, Y ^a   Vladimirsky, O ^a   Morris, K J ^a   Klopf, J M ^a   Calderon, G M ^a   Saile, V ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; IMAGE PROCESSING; IRRADIATION; MASKS; MICROMACHINING; PHOTORESISTS; POLYMETHYL METHACRYLATES; RELAXATION PROCESSES; SCANNING ELECTRON MICROSCOPY; VACUUM; X RAY LITHOGRAPHY;

CROSS SECTION MICROGRAPH; THICKNESS LOSSES; X RAY RESIST;

MICROELECTRONIC PROCESSING;

EID: 0029733099     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00305-3     Document Type: Article

References (8)

1. Spiller, E. and R. Feder, "X-Ray Lithography", in: X-ray Optics, ed., H.J.Quesser (Springer, Berlin) 1977, p.35
2. L.E. Ocola, F. Cerrina, Parametric modeling of photoelectron effects in X-ray lithography, J.Vac.Sci.Technol. B 11(6), ( Nov/Dec 1993), 2839-2844
3. T. Urisu and H. Kyuragi, J. Vac. Sci. Technol. B 5 (5) 1436 (1987)
4. Miller, K.J., J.H. Hellman, and J.A. Moore, Macromolecules 26, 4945 (1993)
5. Y. Vladimirsky, O. Vladimirsky, V. Saile, K.J. Morris, and J. M. Klopf, Proc. SPIE Vol. 2437 (1995) 391-396
6. W. Menz and P. Bley, Mikrosystemtechnik für Ingenieure, (Weinheim), 1993
7. Y. Vladimirsky, K. Morris, J.M. Klopf, O. Vladimirsky, V. Saile and J. Scott, (to be published in Proceedings of the 39th Symposium on Electron, Ion and Photon Beams and Nanofabrication, 1995, Scottsdale, AZ)
8. A. El-Kholi, P. Bley, J. Gottert and J. Mohr, Microelectronic Engineering 21 (1993) 271-274 (Elsevier)