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1
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84888917754
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http://www.zeonchemicals.com/productgrade.asp?id=218
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2
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84888916839
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http://www.microchem.com/products/pmma.htm
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3
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0030271082
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Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography
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J. Albert, S. Thériault, F. Bilodeau, D. C. Johnson, K. O. Hill, P. Sixt, and M. J. Rooks, "Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography," Photonics Technol. Lett., 8 1334-1336 (1996).
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Photonics Technol. Lett.
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, pp. 1334-1336
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Albert, J.1
Thériault, S.2
Bilodeau, F.3
Johnson, D.C.4
Hill, K.O.5
Sixt, P.6
Rooks, M.J.7
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4
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0031103001
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Precise wavelength control for DFB laser diodes by novel corrugation delineation method
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Y. Muroya, T. Nakamura, H. Yamada, and T. Torikai, "Precise wavelength control for DFB laser diodes by novel corrugation delineation method," Photonics Technol. Lett. 9, 288-290 (1997).
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(1997)
Photonics Technol. Lett.
, vol.9
, pp. 288-290
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Muroya, Y.1
Nakamura, T.2
Yamada, H.3
Torikai, T.4
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5
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0343328373
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Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator
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R. C. Tiberio, D. W. Carr, M. J. Rooks, S. J. Mihailov, F. Bilodeau, J. Albert, D. Strykman, D. C. Johnson, K. O. Hill, A. W. McClelland, and B. J. Hughes, "Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator," J. Vac. Sci. Technol. B 16, 3237-3240 (1998).
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J. Vac. Sci. Technol. B
, vol.16
, pp. 3237-3240
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Tiberio, R.C.1
Carr, D.W.2
Rooks, M.J.3
Mihailov, S.J.4
Bilodeau, F.5
Albert, J.6
Strykman, D.7
Johnson, D.C.8
Hill, K.O.9
McClelland, A.W.10
Hughes, B.J.11
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6
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0035481774
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Stitching-error reduction in gratings by shot-shifted electron-beam lithography
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D. J. Dougherty, R. E. Muller, P. D. Maker, and S. Forouhar, "Stitching-error reduction in gratings by shot-shifted electron-beam lithography," J. Lightwave Technology 19, 1527-1531 (2001).
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(2001)
J. Lightwave Technology
, vol.19
, pp. 1527-1531
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Dougherty, D.J.1
Muller, R.E.2
Maker, P.D.3
Forouhar, S.4
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7
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0000573712
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Phase holograms in poly methyl methacrylate
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P. D. Maker, and R. E. Muller, "Phase holograms in poly methyl methacrylate," J. Vac. Sci. Technol. B 10, 2516-2519 (1992).
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(1992)
J. Vac. Sci. Technol. B
, vol.10
, pp. 2516-2519
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Maker, P.D.1
Muller, R.E.2
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9
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2342551836
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Proximity-compensated kinoforms directly written by E-beam lithography
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M. Larsson, M. Ekberg, F. Nikolajeff, and S. Hård, P. D. Maker, and R. E. Muller, "Proximity-compensated kinoforms directly written by E-beam lithography," SPIE Proc. CR49 (1993).
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(1993)
SPIE Proc.
, vol.CR49
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Larsson, M.1
Ekberg, M.2
Nikolajeff, F.3
Hård, S.4
Maker, P.D.5
Muller, R.E.6
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10
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0029733941
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Fabrication and performance of optical interconnect analog phase holograms made by E-beam lithography
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Optoelectronic Interconnects and Packaging, R. T. Chen and P. S. Guilfoyle, eds.
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P. D. Maker, D. W. Wilson, and R. E. Muller, "Fabrication and performance of optical interconnect analog phase holograms made by E-beam lithography," in Optoelectronic Interconnects and Packaging, R. T. Chen and P. S. Guilfoyle, eds., SPIE Proc. CR62, 415-430 (1996).
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(1996)
SPIE Proc.
, vol.CR62
, pp. 415-430
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Maker, P.D.1
Wilson, D.W.2
Muller, R.E.3
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11
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0029773041
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Binary optic reflection grating for an imaging spectrometer
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Diffractive and Holographic Optics Technology III
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D. W. Wilson, P. D. Maker, and R. E. Muller, "Binary optic reflection grating for an imaging spectrometer," in Diffractive and Holographic Optics Technology III, SPIE Proc. 2689 (1996).
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(1996)
SPIE Proc.
, vol.2689
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Wilson, D.W.1
Maker, P.D.2
Muller, R.E.3
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12
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84888923143
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http://www.microchem.com/products/pmgi.htm
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13
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0035043045
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Localized resist heating due to electron-beam patterning during photomask fabrication
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20th Annual BACUS Symposium on Photomask Technology
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Alexander C. Wei, William A. Beckman, Roxann L. Engelstad, John W. Mitchell, Thanh N. Phung, and Jun-Fei Zheng, "Localized resist heating due to electron-beam patterning during photomask fabrication", 20th Annual BACUS Symposium on Photomask Technology, Proc. SPIE 4186, 482 (2001).
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(2001)
Proc. SPIE
, vol.4186
, pp. 482
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Wei, A.C.1
Beckman, W.A.2
Engelstad, R.L.3
Mitchell, J.W.4
Phung, T.N.5
Zheng, J.-F.6
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14
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0141501167
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Subfield scheduling for throughput maximization in electron-beam photomask fabrication
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Emerging Lithographic Technologies VII, R. L. Engelstad (ed.)
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S. V. Babin, A. B. Kahng, I. I. Mandoiu, and S. Muddu, "Subfield scheduling for throughput maximization in electron-beam photomask fabrication,", Emerging Lithographic Technologies VII, R. L. Engelstad (ed.), Proc. SPIE 5037, 934-942 (2003).
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(2003)
Proc. SPIE
, vol.5037
, pp. 934-942
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Babin, S.V.1
Kahng, A.B.2
Mandoiu, I.I.3
Muddu, S.4
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15
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1642514681
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Resist heating dependence on subfield scheduling in 50kV electron beam maskmaking
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Photomask and Next-Generation Lithography Mask Technology X
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S. V. Babin, A. B. Kahng, I. I. Mandoiu, and S. Muddu, "Resist heating dependence on subfield scheduling in 50kV electron beam maskmaking," Photomask and Next-Generation Lithography Mask Technology X, Proc. SPIE 5130, 718-726(2003).
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(2003)
Proc. SPIE
, vol.5130
, pp. 718-726
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Babin, S.V.1
Kahng, A.B.2
Mandoiu, I.I.3
Muddu, S.4
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16
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2342666905
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New convex grating types manufactured by electron beam lithography
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OSA Technical Digest Series
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P. D. Maker, R. E. Muller, D. W. Wilson, and P. Mouroulis, "New convex grating types manufactured by electron beam lithography," in Diffractive Optics and Micro-Optics 10, OSA Technical Digest Series, 234-236 (1998).
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(1998)
Diffractive Optics and Micro-Optics
, vol.10
, pp. 234-236
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Maker, P.D.1
Muller, R.E.2
Wilson, D.W.3
Mouroulis, P.4
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17
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0032209614
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Convex grating types for concentric imaging spectrometers
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P. Mouroulis, D. W. Wilson, P. D. Maker, and R. E. Muller, "Convex grating types for concentric imaging spectrometers," Appl. Optics 37, 7200-7208 (1998).
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(1998)
Appl. Optics
, vol.37
, pp. 7200-7208
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Mouroulis, P.1
Wilson, D.W.2
Maker, P.D.3
Muller, R.E.4
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18
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84888902341
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"Diffractive optical elements on non-flat substrates using electron beam lithography," US Patent. No. 6,480,333, assigned to California Institute of Technology, Pasadena, CA
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P. D. Maker, R. E. Muller, and D. W. Wilson, "Diffractive optical elements on non-flat substrates using electron beam lithography," US Patent. No. 6,480,333, assigned to California Institute of Technology, Pasadena, CA (1998).
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(1998)
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Maker, P.D.1
Muller, R.E.2
Wilson, D.W.3
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19
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85134874249
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Diffractive optical elements for spectral imaging
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Diffractive Optics and Micro Optics, (Optical Society of America, Washington DC)
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D. W. Wilson, P. D. Maker, R. E. Muller, P. Mouroulis, M. R. Descour, C. E. Volin, and E. L. Dereniak, "Diffractive optical elements for spectral imaging," in Diffractive Optics and Micro Optics, OSA Technical Digest (Optical Society of America, Washington DC), pp. 244-246 (2000).
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(2000)
OSA Technical Digest
, pp. 244-246
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Wilson, D.W.1
Maker, P.D.2
Muller, R.E.3
Mouroulis, P.4
Descour, M.R.5
Volin, C.E.6
Dereniak, E.L.7
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20
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2342461734
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Recent advances in blazed grating fabrication by electron-beam lithography
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Pantazis Z. Mouroulis, Warren J. Smith, and R. Barry Johnson, eds.
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D. W. Wilson, P. D. Maker, R. E. Muller, P. Z. Mouroulis, and J. Backlund, "Recent advances in blazed grating fabrication by electron-beam lithography", in Current Developments in Lens Design and Optical Engineering IV, Pantazis Z. Mouroulis, Warren J. Smith, and R. Barry Johnson, eds., 115-126, (2003).
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(2003)
Current Developments in Lens Design and Optical Engineering IV
, pp. 115-126
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Wilson, D.W.1
Maker, P.D.2
Muller, R.E.3
Mouroulis, P.Z.4
Backlund, J.5
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