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Volumn 5720, Issue , 2005, Pages 68-77

Electron-beam lithography for micro and nano-optical applications

Author keywords

Diffractive optics; Electron beam lithography; Micro optics; Nanostructure fabrication

Indexed keywords

BLAZED DIFFRACTION GRATINGS; E-BEAM RESISTS; NANO-OPTICAL DEVICES; NANOSTRUCTURE FABRICATION;

EID: 21844478517     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600784     Document Type: Conference Paper
Times cited : (32)

References (20)
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    • Stitching-error reduction in gratings by shot-shifted electron-beam lithography
    • D. J. Dougherty, R. E. Muller, P. D. Maker, and S. Forouhar, "Stitching-error reduction in gratings by shot-shifted electron-beam lithography," J. Lightwave Technology 19, 1527-1531 (2001).
    • (2001) J. Lightwave Technology , vol.19 , pp. 1527-1531
    • Dougherty, D.J.1    Muller, R.E.2    Maker, P.D.3    Forouhar, S.4
  • 7
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    • Phase holograms in poly methyl methacrylate
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    • Optoelectronic Interconnects and Packaging, R. T. Chen and P. S. Guilfoyle, eds.
    • P. D. Maker, D. W. Wilson, and R. E. Muller, "Fabrication and performance of optical interconnect analog phase holograms made by E-beam lithography," in Optoelectronic Interconnects and Packaging, R. T. Chen and P. S. Guilfoyle, eds., SPIE Proc. CR62, 415-430 (1996).
    • (1996) SPIE Proc. , vol.CR62 , pp. 415-430
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  • 11
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    • (2001) Proc. SPIE , vol.4186 , pp. 482
    • Wei, A.C.1    Beckman, W.A.2    Engelstad, R.L.3    Mitchell, J.W.4    Phung, T.N.5    Zheng, J.-F.6
  • 14
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  • 15
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    • S. V. Babin, A. B. Kahng, I. I. Mandoiu, and S. Muddu, "Resist heating dependence on subfield scheduling in 50kV electron beam maskmaking," Photomask and Next-Generation Lithography Mask Technology X, Proc. SPIE 5130, 718-726(2003).
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  • 16
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    • (1998) Diffractive Optics and Micro-Optics , vol.10 , pp. 234-236
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  • 17
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    • Convex grating types for concentric imaging spectrometers
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  • 18
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    • P. D. Maker, R. E. Muller, and D. W. Wilson, "Diffractive optical elements on non-flat substrates using electron beam lithography," US Patent. No. 6,480,333, assigned to California Institute of Technology, Pasadena, CA (1998).
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  • 19
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    • Diffractive optical elements for spectral imaging
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    • D. W. Wilson, P. D. Maker, R. E. Muller, P. Mouroulis, M. R. Descour, C. E. Volin, and E. L. Dereniak, "Diffractive optical elements for spectral imaging," in Diffractive Optics and Micro Optics, OSA Technical Digest (Optical Society of America, Washington DC), pp. 244-246 (2000).
    • (2000) OSA Technical Digest , pp. 244-246
    • Wilson, D.W.1    Maker, P.D.2    Muller, R.E.3    Mouroulis, P.4    Descour, M.R.5    Volin, C.E.6    Dereniak, E.L.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.