Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers

Applied Optics

Volumn 50, Issue 9, 2011, Pages

  Trost, Marcus ^a,b   Schröder, Sven ^a   Feigl, Torsten ^a   Duparré, Angela ^a   Tünnermann, Andreas ^a,b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM PREPARATION; LIGHT SCATTERING; MULTILAYERS; SUBSTRATES; THIN FILMS;

EXTREME ULTRAVIOLET; LIGHT SCATTERING MEASUREMENT; MULTI-LAYER-COATING; OPTICAL PERFORMANCE; OPTICAL THROUGHPUT; SCATTERING DISTRIBUTIONS; SCATTERING MEASUREMENTS; SCATTERING MECHANISMS;

OPTICAL MULTILAYERS;

EID: 79952785743     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.00C148     Document Type: Article

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