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Volumn 6517, Issue PART 1, 2007, Pages
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Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition
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Author keywords
B4C; Barrier; Deposition; Diffusion; EUV; Interface; Mo; Multilayer; Reflectance; Si; Stress
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Indexed keywords
DEPOSITION;
DIFFUSION;
ELECTRON BEAMS;
MAGNETRON SPUTTERING;
MOLYBDENUM;
REFLECTION;
SILICON;
STRESS ANALYSIS;
THERMODYNAMIC PROPERTIES;
THERMAL PARTICLE DEPOSITION;
ULTRA THIN REFLECTANCE ENHANCEMENT;
MULTILAYERS;
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EID: 35148835211
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.711796 Document Type: Conference Paper |
Times cited : (46)
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References (11)
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