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Volumn 6517, Issue PART 1, 2007, Pages

Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition

Author keywords

B4C; Barrier; Deposition; Diffusion; EUV; Interface; Mo; Multilayer; Reflectance; Si; Stress

Indexed keywords

DEPOSITION; DIFFUSION; ELECTRON BEAMS; MAGNETRON SPUTTERING; MOLYBDENUM; REFLECTION; SILICON; STRESS ANALYSIS; THERMODYNAMIC PROPERTIES;

EID: 35148835211     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711796     Document Type: Conference Paper
Times cited : (46)

References (11)
  • 2
    • 0004055759 scopus 로고
    • SPIE Optical Engineering Press, Bellingham, Washington, USA
    • E. Spiller, Soft X-ray optics, SPIE Optical Engineering Press, Bellingham, Washington, USA, (1994) 170
    • (1994) Soft X-ray optics , pp. 170
    • Spiller, E.1
  • 7
    • 0035766813 scopus 로고    scopus 로고
    • Sasa Bajt, Jennifer B. Alameda, Troy W. Barbee, Jr., W. Miles Gift, James A. Folta, Benjamin B. Kaufmann, Eberhard A. Spiller, Proc. SPIE 4506, p. 65-75 (2001)
    • Sasa Bajt, Jennifer B. Alameda, Troy W. Barbee, Jr., W. Miles Gift, James A. Folta, Benjamin B. Kaufmann, Eberhard A. Spiller, Proc. SPIE Vol. 4506, p. 65-75 (2001)
  • 10
    • 35148864826 scopus 로고    scopus 로고
    • M. Shiraishi, et al SPIE (2004) 5374-11
    • (2004) SPIE , pp. 5374-5311
    • Shiraishi, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.