메뉴 건너뛰기




Volumn 88, Issue 6, 2011, Pages 877-881

Ultradense silicon nanowire arrays produced via top-down planar technology

Author keywords

Electrical characteristics; Silicon nanowires; Top down processing

Indexed keywords

BATCH PROCESS; ELECTRICAL CHARACTERISTIC; LINEAR DENSITY; PLANAR TECHNOLOGY; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; TOP-DOWN PROCESS; TOPDOWN; ULTRADENSE; WIRE ARRAYS;

EID: 79952450139     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.11.034     Document Type: Article
Times cited : (17)

References (34)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.