Multi-silicon ridge nanofabrication by repeated edge lithography

Nanotechnology

Volumn 20, Issue 31, 2009, Pages

  Zhao, Yiping ^a   Berenschot, Erwin ^a   Jansen, Henri ^a   Tas, Niels ^a   Huskens, Jurriaan ^a   Elwenspoek, Miko ^a,b  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b UNIVERSITY OF FREIBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONVENTIONAL PHOTOLITHOGRAPHY; EDGE LITHOGRAPHY; KOH ETCHING; LOCAL OXIDATION OF SILICONS; NANOFABRICATION; NANORIDGES; WAFER SCALE;

FABRICATION; NANOIMPRINT LITHOGRAPHY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON NITRIDE; SILICON OXIDES; SILICON WAFERS;

WET ETCHING;

POTASSIUM HYDROXIDE; SILICON; SILICON NITRIDE;

ARTICLE; NANOFABRICATION; NANOIMAGING; OXIDATION; PARTICLE SIZE; PRIORITY JOURNAL; SURFACE PROPERTY; TEMPERATURE;

EID: 67849106096     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/31/315305     Document Type: Article

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