Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition

Thin Solid Films

Volumn 519, Issue 10, 2011, Pages 3011-3020

  Barve, S A ^a   Jagannath, ^a   Mithal, N ^a   Deo, M N ^a   Biswas, A ^a   Mishra, R ^a   Kishore, R ^a   Bhanage, B M ^b   Gantayet, L M ^a   Patil, D S ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b UNIVERSITY OF MUMBAI   (India)

Author keywords

Far infrared; Metal organic chemical vapor deposition; Microwave electron cyclotron; resonance plasma; Thermogravimetry; Thin films; Yttrium oxide

Indexed keywords

BODY-CENTERED CUBIC; DEPOSITED COATINGS; DEPOSITED FILMS; DEPTH-SENSING NANOINDENTATION; EVAPORATION TEMPERATURE; FAR-INFRARED; FILM PROPERTIES; GLANCING ANGLE X-RAY DIFFRACTIONS; HARDNESS AND ELASTIC MODULUS; HIGHER TEMPERATURES; LOW PRESSURES; METAL ORGANIC CHEMICAL VAPOR DEPOSITION; METAL ORGANIC PRECURSORS; MICROWAVE ELECTRON CYCLOTRON RESONANCE; MULTI-PHASE STRUCTURES; OXIDE THIN FILMS; OXYGEN GAS FLOW; STRUCTURAL TRANSITIONS; SUBSTRATE TEMPERATURE; THERMOGRAVIMETRY; ULTRASOUND METHODS; YTTRIUM HYDROXIDE; YTTRIUM SILICATES;

ARGON; COATINGS; CYCLOTRONS; DEPOSITION; ELECTRON CYCLOTRON RESONANCE; ELECTRONS; EVAPORATION; INDUSTRIAL CHEMICALS; INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALS; MICROWAVES; NANOINDENTATION; ORGANIC CHEMICALS; ORGANOMETALLICS; OXIDE FILMS; OXYGEN; PHASE TRANSITIONS; PLASMA DEPOSITION; PLASMAS; REFRACTIVE INDEX; REFRIGERATING MACHINERY; RESONANCE; SILICATES; SPECTROSCOPIC ELLIPSOMETRY; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; ULTRASONIC APPLICATIONS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM; YTTRIUM OXIDE;

YTTRIUM ALLOYS;

EID: 79952317470     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.12.004     Document Type: Article

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