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Applied Physics A: Materials Science and Processing

Volumn 71, Issue 6, 2000, Pages 615-618

Oxygen-segregation-controlled epitaxy of Y2O3 films on Nb(110)

(5) Hayoz, J a Bovet, M a Pillo, T a Schlapbach, L a Aebi, P a

a UNIVERSITY OF FRIBOURG (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DEPOSITION; ELECTRONIC STRUCTURE; EPITAXIAL GROWTH; NIOBIUM; OXIDATION; OXYGEN; SEGREGATION (METALLOGRAPHY); SINGLE CRYSTALS; STOICHIOMETRY; THIN FILMS; YTTRIUM COMPOUNDS;

ANGLE RESOLVED ULTRAVIOLET PHOTOEMMISION SPECTROSCOPY (ARUPS); X-RAY PHOTOELECTRON DIFFRACTION (XPD);

DIELECTRIC FILMS;

EID: 0034517064 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390000569 Document Type: Article

Times cited : (11)

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