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Volumn 357, Issue 3, 2011, Pages 1096-1100
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Characteristics of sputtered zinc-oxide films prepared by UBM sputtering for thin film transistors
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Author keywords
Crystallinity; Resistivity; Thin film transistor (TFT); Unbalance magnetron sputter; ZnO
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Indexed keywords
CRYSTALLINITIES;
RESISTIVITY;
THIN FILM TRANSISTOR (TFT);
UNBALANCE MAGNETRON SPUTTER;
ZNO;
ELECTRIC PROPERTIES;
FIELD EFFECT TRANSISTORS;
GRAIN SIZE AND SHAPE;
MAGNETRONS;
METALLIC FILMS;
OXIDE FILMS;
SEMICONDUCTING SILICON COMPOUNDS;
SUBSTRATES;
THIN FILMS;
VAPOR DEPOSITION;
ZINC;
ZINC OXIDE;
THIN FILM TRANSISTORS;
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EID: 79251598416
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2010.11.035 Document Type: Article |
Times cited : (1)
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References (27)
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