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Applied Surface Science

Volumn 257, Issue 9, 2011, Pages 3964-3968

Structural properties and electrical characteristics of high-k Dy 2 O 3 gate dielectrics

(3) Pan, Tung Ming a Chang, Wei Tsung a Chiu, Fu Chien b

a CHANG GUNG UNIVERSITY (Taiwan)

b MING CHUAN UNIVERSITY (Taiwan)

Author keywords

Gate dielectric; Postdeposition annealing (PDA)

Indexed keywords

ANNEALING; CAPACITANCE; DIELECTRIC MATERIALS; GATE DIELECTRICS; HIGH-K DIELECTRIC; REACTIVE SPUTTERING; SILICA; SILICON OXIDES; STRUCTURAL PROPERTIES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CAPACITANCE-EQUIVALENT THICKNESS; CAPACITANCE-VOLTAGE CURVE; CONSTANT CURRENT STRESS; ELECTRICAL CHARACTERISTIC; INTERFACE TRAP DENSITY; MORPHOLOGICAL FEATURES; POST DEPOSITION ANNEALING; SILICON SUBSTRATES;

DYSPROSIUM COMPOUNDS;

EID: 78951485564 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.11.144 Document Type: Article

Times cited : (38)

References (27)

1
- 0141747178
- H.R. Huff, A. Hou, C. Lim, Y. Kim, J. Barnett, G. Bersuker, G.A. Brown, C.D. Young, P.M. Zeitzoff, J. Gutt, P. Lysaght, M.I. Gardner, and R.W. Murto Microelectron. Eng. 69 2003 152
- (2003) Microelectron. Eng. , vol.69 , pp. 152
- Huff, H.R.¹ Hou, A.² Lim, C.³ Kim, Y.⁴ Barnett, J.⁵ Bersuker, G.⁶ Brown, G.A.⁷ Young, C.D.⁸ Zeitzoff, P.M.⁹ Gutt, J.¹⁰ Lysaght, P.¹¹ Gardner, M.I.¹² Murto, R.W.¹³

2
- 0036567818
- J. Robertson J. Non-Cryst. Solids 303 2002 94
- (2002) J. Non-Cryst. Solids , vol.303 , pp. 94
- Robertson, J.¹

3
- 0035872897
- G.D. Wilk, R.M. Wallace, and J.M. Anthony J. Appl. Phys. 89 2001 5243
- (2001) J. Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.D.¹ Wallace, R.M.² Anthony, J.M.³

4
- 3042715207
- Institute of Physics London
- M. Houssa High-k Gate Dielectrics 2004 Institute of Physics London
- (2004) High-k Gate Dielectrics
- Houssa, M.¹

5
- 79956019609
- M.H. Cho, Y.S. Roh, C.N. Whang, K. Jeong, H.J. Choi, S.W. Nam, D.H. Ko, J.H. Lee, N.I. Lee, and K. Fujihara Appl. Phys. Lett. 81 2002 1071
- (2002) Appl. Phys. Lett. , vol.81 , pp. 1071
- Cho, M.H.¹ Roh, Y.S.² Whang, C.N.³ Jeong, K.⁴ Choi, H.J.⁵ Nam, S.W.⁶ Ko, D.H.⁷ Lee, J.H.⁸ Lee, N.I.⁹ Fujihara, K.¹⁰

6
- 0036045248
- J.H. Lee, Y.S. Kim, H.S. Jung, J.H. Lee, N.I. Lee, H.K. Kang, J.H. Ku, H.S. Kang, Y.K. Kim, K.H. Cho, and K.P. Suh VLSI Techn. Digest 2002 84
- (2002) VLSI Techn. Digest , pp. 84
- Lee, J.H.¹ Kim, Y.S.² Jung, H.S.³ Lee, J.H.⁴ Lee, N.I.⁵ Kang, H.K.⁶ Ku, J.H.⁷ Kang, H.S.⁸ Kim, Y.K.⁹ Cho, K.H.¹⁰ Suh, K.P.¹¹

7
- 0037421383
- H. Kim, P.C. McIntyre, and K.C. Saraswat Appl. Phys. Lett. 82 2003 106
- (2003) Appl. Phys. Lett. , vol.82 , pp. 106
- Kim, H.¹ McIntyre, P.C.² Saraswat, K.C.³

8
- 79956039125
- M.H. Cho, Y.S. Roh, C.N. Whang, K. Jeong, H.J. Choi, S.W. Nam, D.H. Ko, J.H. Lee, N.I. Lee, and K. Fujihara Appl. Phys. Lett. 81 2002 472
- (2002) Appl. Phys. Lett. , vol.81 , pp. 472
- Cho, M.H.¹ Roh, Y.S.² Whang, C.N.³ Jeong, K.⁴ Choi, H.J.⁵ Nam, S.W.⁶ Ko, D.H.⁷ Lee, J.H.⁸ Lee, N.I.⁹ Fujihara, K.¹⁰

9
- 0043210497
- H. Yamada, T. Shimizu, A. Kurokawa, K. Ishii, and E. Suzuki J. Electrochem. Soc. 150 2003 G429
- (2003) J. Electrochem. Soc. , vol.150 , pp. 429
- Yamada, H.¹ Shimizu, T.² Kurokawa, A.³ Ishii, K.⁴ Suzuki, E.⁵

10
- 1242264931
- J.C. Wang, Y.P. Hung, C.L. Lee, and T.F.U. Lei J. Electrochem. Soc. 151 2004 F17
- (2004) J. Electrochem. Soc. , vol.151 , pp. 17
- Wang, J.C.¹ Hung, Y.P.² Lee, C.L.³ Lei, T.F.U.⁴

11
- 20244384282
- T. Schroeder, T.L. Lee, L. Libralesso, I. Joumard, J. Zegenhagen, P. Zaumseil, C. Wenger, G. Lupina, G. Lippert, J. Dabrowski, and H.J. Mussig Appl. Phys. Lett. 97 2005 074906
- (2005) Appl. Phys. Lett. , vol.97 , pp. 074906
- Schroeder, T.¹ Lee, T.L.² Libralesso, L.³ Joumard, I.⁴ Zegenhagen, J.⁵ Zaumseil, P.⁶ Wenger, C.⁷ Lupina, G.⁸ Lippert, G.⁹ Dabrowski, J.¹⁰ Mussig, H.J.¹¹

12
- 33845397958
- T.M. Pan, J.D. Lee, W.H. Shu, and T.T. Chen Appl. Phys. Lett. 89 2006 232908
- (2006) Appl. Phys. Lett. , vol.89 , pp. 232908
- Pan, T.M.¹ Lee, J.D.² Shu, W.H.³ Chen, T.T.⁴

13
- 55849121951
- A. Laha, E. Bugiel, J.X. Wang, Q.Q. Sun, A. Fissel, and H.J. Osten Appl. Phys. Lett. 93 2008 182907
- (2008) Appl. Phys. Lett. , vol.93 , pp. 182907
- Laha, A.¹ Bugiel, E.² Wang, J.X.³ Sun, Q.Q.⁴ Fissel, A.⁵ Osten, H.J.⁶

14
- 33751584082
- T.M. Pan, C.L. Chen, W.W. Yeh, and S.J. Hou Appl. Phys. Lett. 89 2006 222912
- (2006) Appl. Phys. Lett. , vol.89 , pp. 222912
- Pan, T.M.¹ Chen, C.L.² Yeh, W.W.³ Hou, S.J.⁴

15
- 56749091236
- T.M. Pan, and W.S. Huang J. Electrochem. Soc. 156 2009 G6
- (2009) J. Electrochem. Soc. , vol.156 , pp. 6
- Pan, T.M.¹ Huang, W.S.²

16
- 32944463735
- C.Y. Chang, T.P. Juan, and J.Y. Lee Appl. Phys. Lett. 88 2006 072917
- (2006) Appl. Phys. Lett. , vol.88 , pp. 072917
- Chang, C.Y.¹ Juan, T.P.² Lee, J.Y.³

17
- 34548425156
- F.C. Chiu J. Appl. Phys. 102 2007 044116
- (2007) J. Appl. Phys. , vol.102 , pp. 044116
- Chiu, F.C.¹

18
- 34248669713
- Springer Berlin
- M. Fanciulli, and G. Scarel Rare Earth Oxide Thin Film: Growth, Characterization, and Applications 2007 Springer Berlin
- (2007) Rare Earth Oxide Thin Film: Growth, Characterization, and Applications
- Fanciulli, M.¹ Scarel, G.²

19
- 62649140005
- S. Van Elshocht, C. Adelmann, P. Lehnen, and S. De Gendt Electrochem. Solid-State Lett. 12 2009 G17
- (2009) Electrochem. Solid-State Lett. , vol.12 , pp. 17
- Van Elshocht, S.¹ Adelmann, C.² Lehnen, P.³ De Gendt, S.⁴

20
- 34548475050
- G. Scarel, A. Debernardi, D. Tsoutsou, S. Spiga, S.C. Capelli, L. Lamagna, S.N. Volkos, M. Alia, and M. Fanciulli Appl. Phys. Lett. 91 2007 102901
- (2007) Appl. Phys. Lett. , vol.91 , pp. 102901
- Scarel, G.¹ Debernardi, A.² Tsoutsou, D.³ Spiga, S.⁴ Capelli, S.C.⁵ Lamagna, L.⁶ Volkos, S.N.⁷ Alia, M.⁸ Fanciulli, M.⁹

21
- 0000114509
- B.F. Dzhurinskii, D. Gati, N.P. Sergushin, V.I. Nefedov, and V.Ya. Salyn Russ. J. Inorg. Chem. 20 1975 2307
- (1975) Russ. J. Inorg. Chem. , vol.20 , pp. 2307
- Dzhurinskii, B.F.¹ Gati, D.² Sergushin, N.P.³ Nefedov, V.I.⁴ Salyn, V.Ya.⁵

22
- 0003708256
- Physical Electronics Chanhassen, MN
- J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben Handbook of X-ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data 1995 Physical Electronics Chanhassen, MN
- (1995) Handbook of X-ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data
- Moulder, J.F.¹ Stickle, W.F.² Sobol, P.E.³ Bomben, K.D.⁴

23
- 0004177869
- Plenum New York
- G.V. Samsonov The Oxide Handbook 1982 Plenum New York
- (1982) The Oxide Handbook
- Samsonov, G.V.¹

24
- 10044287119
- J. Paivasaari, M. Putkonen, and L. Niinist Thin Solid Films 472 2005 275
- (2005) Thin Solid Films , vol.472 , pp. 275
- Paivasaari, J.¹ Putkonen, M.² Niinist, L.³

25
- 0019056629
- W.A. Hill, and C.C. Coleman Solid-State Electron. 23 1980 987
- (1980) Solid-State Electron. , vol.23 , pp. 987
- Hill, W.A.¹ Coleman, C.C.²

26
- 18644361821
- J.C. Wang, S.H. Chiao, C.L. Lee, T.F. Lei, Y.M. Lin, M.F. Wang, S.C. Chen, C.H. Yu, and M.S. Liang J. Appl. Phys. 92 2002 3936
- (2002) J. Appl. Phys. , vol.92 , pp. 3936
- Wang, J.C.¹ Chiao, S.H.² Lee, C.L.³ Lei, T.F.⁴ Lin, Y.M.⁵ Wang, M.F.⁶ Chen, S.C.⁷ Yu, C.H.⁸ Liang, M.S.⁹

27
- 0008536196
- R. Degraeve, G. Groeseneken, R. Bellens, J.L. Ogier, M. Depas, P.J. Roussel, and H.E. Maes IEEE Trans. Electron. Devices 45 1998 904
- (1998) IEEE Trans. Electron. Devices , vol.45 , pp. 904
- Degraeve, R.¹ Groeseneken, G.² Bellens, R.³ Ogier, J.L.⁴ Depas, M.⁵ Roussel, P.J.⁶ Maes, H.E.⁷

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