Fabrication of truncated silicon pyramid arrays by electrochemical etching

Electrochemical and Solid-State Letters

Volumn 12, Issue 12, 2009, Pages

  Seo, Hong Seok ^a   Li, Xiaopeng ^a   Um, Han Don ^a   Yoo, Bongyoung ^a   Cho, Yong Woo ^a   Lee, Jung Ho ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; CURRENT PEAK; FLAT-TOP; PYRAMID ARRAYS; PYRAMID STRUCTURE; SHARP TIP; SILICON ARRAYS; SINGLE CRYSTAL SILICON; SURFACE PROFILES; TOPOLOGICAL VARIATIONS; TRUNCATED PYRAMIDS;

DISSOLUTION; OPTOELECTRONIC DEVICES; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

ELECTROCHEMICAL ETCHING;

EID: 70350045032     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3231135     Document Type: Article

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