Direct metal contact printing lithography for patterning sub-micrometer surface structures on a sapphire substrate

Journal of Micromechanics and Microengineering

Volumn 21, Issue 1, 2011, Pages

  Hsieh, Yi Ta ^a   Lee, Yung Chun ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT PRINTING LITHOGRAPHY; ETCHING DEPTH; ETCHING MASKS; ETCHING SELECTIVITY; HIGH BRIGHTNESS LEDS; METAL CONTACTS; METAL FILM; NEW APPROACHES; PATTERNED SAPPHIRE SUBSTRATE; SAPPHIRE SUBSTRATES; SILICON MOLDS; SUBMICROMETERS; SURFACE AREA;

ELECTROMAGNETIC INDUCTION; INDUCTIVELY COUPLED PLASMA; LIGHT EMITTING DIODES; LITHOGRAPHY; METALLIC FILMS; METALS; MICROMETERS; PLASMA ETCHING; PRINTING; SAPPHIRE; SURFACE STRUCTURE;

SUBSTRATES;

EID: 78651482253     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/1/015001     Document Type: Article

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