Micro-/nano-lithography based on the contact transfer of thin film and mask embedded etching

Journal of Micromechanics and Microengineering

Volumn 18, Issue 7, 2008, Pages

  Lee, Yung Chun ^a   Chiu, Cheng Yu ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; LITHOGRAPHY; METALLIZING; METALS; OPTICAL DESIGN; POLYMERS; SUBSTRATES; THICK FILMS;

ANTI ADHESION; CONTACT IMPRINTING; CONTACT TRANSFER; DIFFERENT SUBSTRATES; ETCHING MASKS; EXPERIMENTAL TESTING; FABRICATION PROCESSES; FEATURE SIZES; LINEAR GRATINGS; METAL FILMS; METAL PATTERNING; MICRO-AND NANO-PATTERNING; NANO-LITHOGRAPHY; NANO-STRUCTURES; POLYMER LAYERS; STRENGTH (IGC: D5/D6); SUB MICRONS;

ETCHING;

EID: 47249122194     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/7/075013     Document Type: Article

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