Importance of trimethylaluminum diffusion in three-step ABC molecular layer deposition using trimethylaluminum, ethanolamine, and maleic anhydride

Langmuir

Volumn 26, Issue 24, 2010, Pages 19045-19051

  Seghete, Dragos ^a   Hall, Robert A ^a   Yoon, Byunghoon ^a   George, Steven M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETHANOLAMINES; FICKIAN DIFFUSION; LIMITING BEHAVIOR; MASS GAIN; MOLECULAR LAYER DEPOSITION; MULTIPLE-DOSE; NUMERICAL MODELING; ORGANIC-INORGANIC; REACTION CONDITIONS; REACTION SEQUENCES; STEADY STATE; TRIMETHYLALUMINUM; X RAY REFLECTIVITY;

DIFFUSION; MALEIC ANHYDRIDE; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SELF ASSEMBLY; SURFACE REACTIONS; THERMOANALYSIS;

FILM GROWTH;

EID: 78650222488     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la102649x     Document Type: Article

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