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Volumn 28, Issue 6, 2010, Pages

Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; DURABILITY; ELECTRON SPIN RESONANCE SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INDICATORS (CHEMICAL); MOLDS; NANOIMPRINT LITHOGRAPHY; NANOINDENTATION; POLYMERIZATION; QUARTZ; SPIN DYNAMICS; SURFACE CHEMISTRY; SURFACE TREATMENT;

EID: 78650137827     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3501339     Document Type: Article
Times cited : (7)

References (17)
  • 13
    • 72849106852 scopus 로고    scopus 로고
    • JVTBD9 1071-1023,. 10.1116/1.3245993
    • M. Zelsmann, J. Vac. Sci. Technol. B JVTBD9 1071-1023 27, 2873 (2009). 10.1116/1.3245993
    • (2009) J. Vac. Sci. Technol. B , vol.27 , pp. 2873
    • Zelsmann, M.1
  • 15
    • 0026875935 scopus 로고
    • JMREEE 0884-2914,. 10.1557/JMR.1992.1564
    • W. C. Oliver and G. M. Pharr, J. Mater. Res. JMREEE 0884-2914 7, 1564 (1992). 10.1557/JMR.1992.1564
    • (1992) J. Mater. Res. , vol.7 , pp. 1564
    • Oliver, W.C.1    Pharr, G.M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.