Analysis on deterioration mechanism of release layer in nanoimprint process

Journal of Photopolymer Science and Technology

Volumn 20, Issue 4, 2007, Pages 545-548

  Tada, Yasuhiko ^a   Yoshida, Hiroshi ^a   Miyauchi, Akihiro ^a  

^a HITACHI LTD   (Japan)

Author keywords

Deterioration mechanism; Nanoimrint; Release layer

Indexed keywords

EID: 37548999329     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.545     Document Type: Article

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