Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2384-2387

  Voisin, P ^a,b   Zelsmann, M ^c   Ridaoui, H ^c   Chouiki, M ^c   Gourgon, C ^c   Boussey, J ^c   Zahouily, K ^d  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

^c CNRS   (France)

^d Photo'Npolymers   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MONOMERS; OPTIMIZATION; PHOTOLITHOGRAPHY; PHOTOPOLYMERIZATION; PLASMA ETCHING;

ETCH RATES; PHOTOINITIATORS; RESISTS;

NANOIMPRINT LITHOGRAPHY;

EID: 37149000309     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2804519     Document Type: Article

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