-
1
-
-
5344268855
-
-
0734-211X 10.1116/1.588604
-
J. Haisma, M. Verheijen, K. van den Heuvel, and J. van den Berg, J. Vac. Sci. Technol. B 0734-211X 10.1116/1.588604 14, 4124 (1996); M. Colburn, Proc. SPIE 3676, 379 (1999).
-
(1996)
J. Vac. Sci. Technol. B
, vol.14
, pp. 4124
-
-
Haisma, J.1
Verheijen, M.2
Van Den Heuvel, K.3
Van Den Berg, J.4
-
2
-
-
0032625408
-
-
J. Haisma, M. Verheijen, K. van den Heuvel, and J. van den Berg, et al., J. Vac. Sci. Technol. B 0734-211X 10.1116/1.588604 14, 4124 (1996); M. Colburn, Proc. SPIE 3676, 379 (1999).
-
(1999)
Proc. SPIE
, vol.3676
, pp. 379
-
-
Colburn, M.1
-
3
-
-
17344376714
-
-
M. Otto, M. Bender, F. Richter, B. Hadam, T. Kleim, R. Jede, B. Spangenberg, and H. Kurz, Microelectron. Eng. 73-74, 152 (2004).
-
(2004)
Microelectron. Eng.
, vol.73-74
, pp. 152
-
-
Otto, M.1
Bender, M.2
Richter, F.3
Hadam, B.4
Kleim, T.5
Jede, R.6
Spangenberg, B.7
Kurz, H.8
-
5
-
-
0032148208
-
-
0013-7944 10.1016/S0013-7944(98)00052-6
-
R. H. Dauskardt, M. Lane, Q. Ma, and N. Krishna, Eng. Fract. Mech. 0013-7944 10.1016/S0013-7944(98)00052-6 61, 142 (1998); M. Lane, Annu. Rev. Mater. Res. 33, 29 (2003).
-
(1998)
Eng. Fract. Mech.
, vol.61
, pp. 142
-
-
Dauskardt, R.H.1
Lane, M.2
Ma, Q.3
Krishna, N.4
-
6
-
-
0042280806
-
-
R. H. Dauskardt, M. Lane, Q. Ma, and N. Krishna, Eng. Fract. Mech. 0013-7944 10.1016/S0013-7944(98)00052-6 61, 142 (1998); M. Lane, Annu. Rev. Mater. Res. 33, 29 (2003).
-
(2003)
Annu. Rev. Mater. Res.
, vol.33
, pp. 29
-
-
Lane, M.1
-
8
-
-
0034316495
-
-
T. Bailey, B. J. Choi, M. Colburn, M. Meissl, S. Shaya, J. G. Ekerdt, S. V. Sreenivasan, and C. G. Willson, J. Vac. Sci. Technol. B 18, 3572 (2000).
-
(2000)
J. Vac. Sci. Technol. B
, vol.18
, pp. 3572
-
-
Bailey, T.1
Choi, B.J.2
Colburn, M.3
Meissl, M.4
Shaya, S.5
Ekerdt, J.G.6
Sreenivasan, S.V.7
Willson, C.G.8
-
9
-
-
0034268805
-
-
T. M. Mayer, M. P. de Boer, N. D. Shinn, P. J. Clews, and T. A. Michalske, J. Vac. Sci. Technol. B 18, 2433 (2000).
-
(2000)
J. Vac. Sci. Technol. B
, vol.18
, pp. 2433
-
-
Mayer, T.M.1
De Boer, M.P.2
Shinn, N.D.3
Clews, P.J.4
Michalske, T.A.5
-
10
-
-
14044274934
-
-
G.-Y. Jung, Z. Li, W. Wu, Y. Chen, D. L. Olynick, S.-Y. Wang, W. M. Tong, and R. S. Williams, Langmuir 21, 1158 (2005).
-
(2005)
Langmuir
, vol.21
, pp. 1158
-
-
Jung, G.-Y.1
Li, Z.2
Wu, W.3
Chen, Y.4
Olynick, D.L.5
Wang, S.-Y.6
Tong, W.M.7
Williams, R.S.8
-
11
-
-
29544450422
-
-
K. Wu, T. Bailey, C. G. Willson, and J. G. Ekerdt, Langmuir 21, 11795 (2005).
-
(2005)
Langmuir
, vol.21
, pp. 11795
-
-
Wu, K.1
Bailey, T.2
Willson, C.G.3
Ekerdt, J.G.4
-
12
-
-
0036614046
-
-
M. Komuro, Y. Tokano, J. Taniguchi, T. Kawasaki, I. Miyamoto, and H. Hiroshima, Jpn. J. Appl. Phys., Part 1 41, 4182 (2002).
-
(2002)
Jpn. J. Appl. Phys., Part 1
, vol.41
, pp. 4182
-
-
Komuro, M.1
Tokano, Y.2
Taniguchi, J.3
Kawasaki, T.4
Miyamoto, I.5
Hiroshima, H.6
-
13
-
-
33745624254
-
-
J. Jeong, K. Kim, Y. Sim, D. Choi, E. Lee, S. Park, T. Lim, and D. Yang, Proc. SPIE 6151, 61512J (2006).
-
(2006)
Proc. SPIE
, vol.6151
-
-
Jeong, J.1
Kim, K.2
Sim, Y.3
Choi, D.4
Lee, E.5
Park, S.6
Lim, T.7
Yang, D.8
-
14
-
-
34249701875
-
-
F. A. Houle, C. T. Rettner, D. C. Miller, and R. Sooriyakumaran, Appl. Phys. Lett. 90, 213103 (2007).
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 213103
-
-
Houle, F.A.1
Rettner, C.T.2
Miller, D.C.3
Sooriyakumaran, R.4
-
16
-
-
34547569491
-
-
Ph. D. dissertation, Univ. of Texas at Austin
-
T. Bailey, Ph. D. dissertation, Univ. of Texas at Austin, 2003, Chap. 5.
-
(2003)
-
-
Bailey, T.1
-
18
-
-
34547558748
-
-
Resist formulations obtained from Matthew Colburn, IBM.
-
Resist formulations obtained from Matthew Colburn, IBM.
-
-
-
-
22
-
-
0037165921
-
-
J. M. Snodgrass, D. Pantelidis, M. L. Jenkins, J. C. Bravman, and R. H. Dauskardt, Acta Mater. 50, 2395 (2002).
-
(2002)
Acta Mater.
, vol.50
, pp. 2395
-
-
Snodgrass, J.M.1
Pantelidis, D.2
Jenkins, M.L.3
Bravman, J.C.4
Dauskardt, R.H.5
-
26
-
-
3843090434
-
-
X. Gu, et al., JCT Res. 1, 191 (2004).
-
(2004)
JCT Res.
, vol.1
, pp. 191
-
-
Gu, X.1
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