Double-anchoring fluorinated molecules for antiadhesion mold treatment in UV nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2873-2876

  Zelsmann, M ^a   Truffier Boutry, D ^a   Francone, A ^a   Alleaume, C ^a   Kurt, I ^a   Beaurain, A ^a   Pelissier, B ^a   Pepin Donat B ^b   Lombard, C ^b   Boussey, J ^a  

^a CEA LETI   (France)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIADHESION; COVALENT GRAFTING; ELECTRON SPIN RESONANCE; FLUORINATED MOLECULES; MECHANICAL RESISTANCE; MOLD SURFACES; PERFLUOROPOLYETHERS; UV NANOIMPRINT LITHOGRAPHY;

ANGLE MEASUREMENT; CHEMICAL RESISTANCE; CONTACT ANGLE; FLUORINE CONTAINING POLYMERS; GRAFTING (CHEMICAL); MOLDS; MOLECULES; NANOIMPRINT LITHOGRAPHY; SPIN DYNAMICS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON SPIN RESONANCE SPECTROSCOPY;

EID: 72849106852     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3245993     Document Type: Conference Paper

References (14)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995).
2. J. Haisma, M. Verheijein, K. van den Heuvel, and J. van den Berg, J. Vac. Sci. Technol. B 14, 4124 (1996).
3. K. Wu, X. Wang, E. K. Kim, C. G. Willson, and J. G. Ekerdt, Langmuir 23, 1166 (2007).
4. H. Schift, S. Saxer, S. Park, C. Padeste, U. Pieles, and J. Gobrecht, Nanotechnology 16, S171 (2005).
5. M. Beck, M. Graczyk, I. Maximov, E. -L. Sarwe, T. G. I. Ling, M. Keil, and L. Montelius, Microelectron. Eng. 61-62, 441 (2002).
6. F. A. Houle, S. Raoux, D. C. Miller, C. Jahnes, and S. Rossnagel, J. Vac. Sci. Technol. B 26, 1301 (2008).
7. K. -I. Nakamatsu, N. Yamada, K. Kanda, Y. Haruyama, and S. Matsui, Jpn. J. Appl. Phys., Part 2 45, L954 (2006).
8. Y. Tada, H. Yoshida, and A. Miyauchi, J. Photopolym. Sci. Technol. 20, 545 (2007).
9. F. A. Houle, E. Guyer, D. C. Miller, and R. Dauskardt, J. Vac. Sci. Technol. B 25, 1179 (2007).
10. D. Truffier-Boutry, M. Zelsmann, J. De Girolamo, J. Boussey, C. Lombard, and B. Pépin-Donat, Appl. Phys. Lett. 94, 044110 (2009).
11. D. Truffier-Boutry, R. Galand, A. Beaurain, A. Francone, B. Pelissier, M. Zelsmann, and J. Boussey, Microelectron. Eng. 86, 669 (2009).
12. S. Garidel, M. Zelsmann, N. Chaix, P. Voisin, J. Boussey, A. Beaurain, and B. Pelissier, J. Vac. Sci. Technol. B 25, 2430 (2007).
13. D. Truffier-Boutry, A. Beaurain, R. Galand, B. Pelissier, J. Boussey, and M. Zelsmann, " XPS study of the degradation mechanism of fluorinated antisticking treatments used in UV nanoimprint lithography.," Microelectron. Eng. (to be published).
14. G. Beamson and D. Briggs, High resolution XPS of Organic Polymers. The Scienta ESCA300 Database (Wiley, Chichester, 1992).