Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 4, 2008, Pages 1301-1304

  Houle, F A ^a   Raoux, S ^a   Miller, D C ^a   Jahnes, C ^b   Rossnagel, S ^b  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION ENERGIES; AMORPHOUS METALS; NANO IMPRINTS; RELEASE COATINGS; RELEASE LAYER; TEMPLATE MATERIALS; VAN DER WAALS;

CURING; DRYING; FRACTURE FIXATION; METALS; NANOIMPRINT LITHOGRAPHY; NITRIDES; SILANES; ULTRATHIN FILMS; VAN DER WAALS FORCES;

AMORPHOUS FILMS;

EID: 49749142342     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2939258     Document Type: Article

References (20)

1. J. Haisma, M. Verheijen, K. van den Heuvel, and J. van den Berg, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.588604 14, 4124 (1996).
2. M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Proc. SPIE 0277-786X 10.1117/12.351155 3676, 379 (1999).
3. T. Bailey, B. J. Choi, M. Colburn, M. Meissi, S. Shaya, J. G. Ekerdt, S. V. Sreenivasan, and C. G. Willson, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1324618 18, 3572 (2000).
4. J. O. Foley, E. Fu, L. J. Gamble, and P. Yager, Langmuir 24, 3628 (2008). 0743-7463
5. G. -Y. Jung, Z. Li, W. Wu, Y. Chen, D. L. Olynick, S. -Y. Wang, W. M. Tong, and R. S. Williams, Langmuir 0743-7463 10.1021/la0476938 21, 1158 (2005).
6. F. A. Houle, E. Guyer, D. C. Miller, and Reinhold Dauskardt, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.2126671 23, 2427 (2007).
7. F. A. Houle, C. T. Rettner, D. C. Miller, and R. Sooriyakumaran, Appl. Phys. Lett. 0003-6951 10.1063/1.2740578 90, 213103 (2007).
8. S. A. Smallwood, K. C. Eapen, S. T. Patton, and J. S. Zabinski, Wear 260, 1179 (2006). 0043-1648
9. J. -H. Jeong, K. -D. Kim, Y. -S. Kim, D. -G. Choi, E. -S. Lee, S. -H. Park, T. -W. Lim, and D. -Y. Yang, Proc. SPIE 0277-786X 10.1117/12.657132 6151, 61512J (2006).
10. M. Komuro, Y. Tokano, J. Taniguchi, T. Kawasaki, I. Miyamoto, and H. Hiroshima, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.41.4182 41, 4182 (2002).
11. A. O. Altun, J. -H. Jeong, J. -J. Rha, K. -D. Kim, and E. -S. Lee, Nanotechnology 0957-4484 10.1088/0957-4484/18/46/465302 18, 465302 (2007).
12. F. A. Houle, E. Guyer, D. C. Miller, R. Dauskardt, E. Rice, and J. Hamilton, Proc. SPIE 6153, 61531B (2006). 0277-786X
13. S. C. Johnson, S. C. Bailey, M. D. Dickey, B. J. Smith, E. K. Kim, A. T. Jamieson, N. A. Stacey, J. G. Ekerdt, C. G. Willson, D. P. Mancini, W. J. Dauksher, K. J. Nordquist, and D. J. Resnick, Proc. SPIE 0277-786X 10.1117/12.484985 5037, 197 (2003).
14. B. J. Choi, F. Y. Xu, N. A. Stacey, V. X. H. Truskett, and M. P. C. Watts, U.S. Patent No. 7,157,036 (Jan 2, 2007).
15. F. A. Houle, A. Fornof, R. Sooriyakumaran, H. Truong, D. C. Miller, M. I. Sanchez, B. Davis, T. Magbitang, R. D. Allen, M. W. Hart, and G. Dubois, Proc. SPIE 6519, 65191C (2007). 0277-786X
16. H. Ito, F. A. Houle, M. W. Hart, and R. A. DiPietro, Proc. SPIE 6153, 61531A (2006). 0277-786X
17. J. Israelachvili, Intermolecular and Surface Forces, 2nd ed. (Academic, Amsterdam, 1992), pp. 178-179.
18. F. A. Houle (unpublished).
19. Y. S. Li and P. M. Duxbury, Phys. Rev. B 0163-1829 10.1103/PhysRevB.38. 9257 38, 9257 (1988).
20. R. H. Dauskardt, M. Lane, Q. Ma, and N. Krishna, Eng. Fract. Mech. 0013-7944 10.1016/S0013-7944(98)00052-6 61, 141 (1998).