Improvement of actinic blank inspection and phase defect analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7823, Issue PART 1, 2010, Pages

  Yamane, Takeshi ^a   Tanaka, Toshihiko ^a   Terasawa, Tsuneo ^a   Suga, Osamu ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Actinic; EUVL; Inspection; Mask blank; Phase defect

Indexed keywords

ACTINIC; DARK FIELD IMAGING; DETECTION PROBABILITIES; EUVL; FULL-FIELD; MASK BLANK; MULTILAYER PHASE; PHASE DEFECTS; SENSITIVITY IMPROVEMENTS;

CAMERAS; CCD CAMERAS; DEFECTS; PHOTOMASKS;

INSPECTION;

EID: 78649810742     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.864290     Document Type: Conference Paper

References (14)

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