Actinic EUVL mask blank inspection capability with time delay integration mode

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Yamane, Takeshi ^a   Tanaka, Toshihiko ^a   Terasawa, Tsuneo ^a   Suga, Osamu ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Actinic inspection; Detection probability; EUVL mask; False defect; Phase defect

Indexed keywords

ACTINIC INSPECTION; CURRENT SYSTEM; DARK FIELD IMAGING; DEFECT DETECTION; DEFECT DETECTION ALGORITHM; DEFECT SENSITIVITY; DETECTION PROBABILITY; DETECTION THRESHOLD; EUVL MASK BLANKS; FALSE DEFECT; FULL-FIELD; MASK BLANK INSPECTION; MULTILAYER PHASE; NOISE LEVELS; PHASE DEFECTS; SIGNAL INTENSITIES; TIME DELAY INTEGRATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION; PHOTOMASKS;

DEFECTS;

EID: 77953445659     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.829724     Document Type: Conference Paper

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