Influence of O2/Ar flow ratio on the structure and optical properties of sputtered hafnium dioxide thin films

Surface and Coatings Technology

Volumn 205, Issue 7, 2010, Pages 2120-2125

  Liu, Wenting ^a   Liu, Zhengtang ^a   Yan, Feng ^a   Tan, Tingting ^a   Tian, Hao ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Band gap energy; Hafnium dioxide; O2 Ar flow ratio; Refractive index; RF magnetron sputtering

Indexed keywords

BAND GAP ENERGY; CRYSTALLINITIES; FLOW RATIOS; HAFNIUM DIOXIDE; MONOCLINIC PHASE; POLYCRYSTALLINE; PREFERENTIAL GROWTH; QUARTZ SUBSTRATE; RANDOM ORIENTATIONS; RF REACTIVE MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; SCAN ELECTRON MICROSCOPY; SEM; UV VISIBLE SPECTROSCOPY;

ARGON; CRYSTALLITE SIZE; DEPOSITION; DEPOSITION RATES; ENERGY GAP; FILM GROWTH; HAFNIUM; HAFNIUM OXIDES; LIGHT REFRACTION; MAGNETRON SPUTTERING; OXYGEN; QUARTZ; REFRACTIVE INDEX; REFRACTOMETERS; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION;

FILM PREPARATION;

EID: 78649736197     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.08.116     Document Type: Article

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