Optical properties of fluids for 248 and 193 nm immersion photolithography

Applied Optics

Volumn 45, Issue 8, 2006, Pages 1721-1724

  Kaplan, Simon G ^a   Burnett, John H ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER APPLICATIONS; LIGHT ABSORPTION; ORGANIC SOLVENTS; PHOTOLITHOGRAPHY; REFRACTOMETERS;

AQUEOUS INORGANIC SOLUTIONS; HILGER-CHANCE REFRACTOMETER SYSTEMS; IMMERSION PHOTOLITHOGRAPHY; THERMO-OPTIC COEFFICIENT;

FLUID MECHANICS;

EID: 33645764469     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.001721     Document Type: Article

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