Applications of TM polarized illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Smith, Bruce ^a   Zhou, Jianming ^a   Xie, Peng ^a  

^a Rochester Institute of Technology   (United States)

Author keywords

Hyper NA; Polarized illumination; TM contrast; TM polarization

Indexed keywords

(E ,3E) PROCESS; CONVENTIONAL MATERIALS; DIFFRACTED BEAMS; DOUBLE EXPOSURE; DOUBLE PATTERNING; ENGINEERING CHALLENGES; FREQUENCY DOUBLING; HARD MASKS; HIGH NA; IMAGING ANGLES; IMMERSION FLUIDS; IN ORDER; NUMERICAL APERTURE (NA); OBLIQUE ANGLES; OPTICAL MICRO LITHOGRAPHY; PATTERN RESOLUTION; PHOTORESIST FILMS; PHOTORESIST LAYERS; POLARIZED ILLUMINATION; POLYACRYLATE (PA); SINGLE EXPOSURE; SUBSTRATE REFLECTIVITY; THIN FILM SILICON; TM POLARIZATIONS; TRANSVERSE ELECTRIC (TE) POLARIZATIONS; TRANSVERSE MAGNETIC (TM) POLARIZATIONS;

ARCHITECTURAL DESIGN; COMPUTER NETWORKS; ELECTROACUPUNCTURE; FLUIDICS; LITHOGRAPHY; MODULATION; NUMERICAL METHODS; PHOTORESISTORS; PHOTORESISTS; PIGMENTS; PROCESS ENGINEERING; PRODUCTION ENGINEERING; REFLECTION; SILICON; SILICON COMPOUNDS; SODIUM; STORAGE ALLOCATION (COMPUTER); SURFACE TREATMENT; TECHNOLOGY; TELLURIUM COMPOUNDS; THICK FILMS; THIN FILMS; WATER RECYCLING;

POLARIZATION;

EID: 45449108421     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.775739     Document Type: Conference Paper

References (9)

1. Flagello, D.G and Milster, T.D., "Experimental verification of high-numerical aperture effects in phtotresist," Proc. SPIE 2197, (1994).
2. Smith, B.W., and Cashmore, J., "Challenges in high NA, polarization, and photoresist," Proc. SPIE 4691, (2002).
3. Socha, R., Shi, X. LeHoty, D., "Simultaneous source mask optimization (SMO)," Proc. SPIE 5853, (2005).
4. Smith, B.W., Zhou, J., "Snell or Fresnel - The influence of material index on hyper NA lithography," Proc. SPIE 6520, (2007).
5. Rosenbluth, A., Melville, D., Tian, K., Lai, K., Seong, N., Pfeiffer, D., Colburn.M., "Global optimization of masks, including film stack design to restore TM contrast in high NA TCCs," Proc. SPIE 6520, (2007).
6. Smith, B.W., Zavyalova, L., Estroff, A., "Benefitting from polarization - effects of high-NA on imaging," Proc. SPIE 5377, (2004)
7. Zhou, J., Lafferty, N., Smith, B.W., Burnett, J., "Immersion lithography with numerical apertures above 2.0 using high index optical materials," Proc. SPIE 6520, (2007).
8. Fan, Y., Bourov, A., Zavyalova, L., Zhou, J., Estroff, A., Lafferty, N., "ILSim - A compact simulation tool for inteferometric lithography," Proc. SPIE 5754, (2005).
9. Prolith/10KLA/Tencor, (2008).