Beam alignment for scanning beam interference lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 3071-3074

  Chen, Carl G ^a   Heilmann, Ralf K ^a   Joo, Chulmin ^a   Konkola, Paul T ^a   Pati, G S ^a   Schattenburg, Mark L ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERGENCE OF NUMERICAL METHODS; DIFFRACTION GRATINGS; INTERFEROMETERS; ITERATIVE METHODS; LIGHT INTERFERENCE; MIRRORS; OPTICAL BEAM SPLITTERS; OPTICAL DESIGN; OPTICAL INSTRUMENT LENSES; PHOTODETECTORS; PHOTOLITHOGRAPHY;

BEAM ALIGNMENT; GAUSSIAN LASER BEAM; POSITION SENSING DETECTOR; SCANNING BEAM INTERFERENCE LITHOGRAPHY;

LASER BEAMS;

EID: 0036883207     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1523402     Document Type: Article

References (6)

1. M. L. Schattenburg et al., J. Vac. Sci. Technol. B 17, 2692 (1999).
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3. C. Joo et al., J. Vac. Sci. Technol. B, these proceedings.
4. R. K. Heilmann et al., J. Vac. Sci. Technol. B 19, 2342 (2001).
5. C. G. Chen et al., Proceedings of ASPE 16th Annual Meeting (American Society for Precision Engineering, 2001), p. 216.
6. P. T. Konkola, C. G. Chen, R. K. Heilmann, and M. L. Schattenburg, J. Vac. Sci. Technol. B 18, 3282 (2000).