Characterization of the remote plasma generated in a pulsed-DC gas-flow hollow-cathode discharge

IEEE Transactions on Plasma Science

Volumn 35, Issue 3, 2007, Pages 527-533

  Paduraru, Cristian ^a   Becker, Kurt H ^a,b   Belkind, Abe ^a,c   Lopez, Jose L ^a,d   Aranda Gonzalvo, Y ^e  

^a Stevens Institute of Technology   (United States)

^b POLYTECHNIC UNIVERSITY   (United States)

^c A Belkind and Associates LLC   (United States)

^d SAINT PETER'S UNIVERSITY   (United States)

^e HIDEN ANALYTICAL LTD   (United Kingdom)

Author keywords

Electron temperature; Hollow cathode; Langmuir probe; Plasma density; Pulsed power; Time resolved

Indexed keywords

ELECTRON TEMPERATURE; GAS DISCHARGE TUBES; LANGMUIR PROBES; PLASMA DENSITY; REACTIVE SPUTTERING; SPUTTER DEPOSITION;

PULSED-DC GAS-FLOW HOLLOW-CATHODE DISCHARGE; TIME-RESOLVED OPTICAL EMISSION SPECTROSCOPY;

CATHODES;

EID: 34347395363     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2007.895230     Document Type: Article

References (27)

1. K. Ishii, "High-rate low kinetic gas-flow-sputtering," J. Vac. Sci. Technol., vol. A7, no. 2, p. 256, 1989.
2. T. Jung and A. Westphal, "High rate deposition of alumina films by reactive gas flow sputtering," Surf. Coat. Technol., vol. 59, no. 1-3, p. 171, Oct. 1993.
3. A. Belkind, H. Li, H. Clow, and F. Jansen, "Oil removal from metals by linear multi-orifice hollow cathode," Surf. Coat. Technol., vol. 76/77, p. 738, 1995.
4. L. Bardos, H. Barankova, and S. Berg, "Thin film processing by radio frequency hollow cathodes," Surf. Coat. Technol., vol. 97, no. 1-3, pp. 723-728, Dec. 1997.
5. A. Helmlmich, T. Jung, and A. Kielhorn, "CVD-processes by hollow cathode glow discharge," Surf. Coat. Technol., vol. 98, no. 1-3, pp. 1541-1546, Jan. 1998.
6. T. Kabler and T. Jung, "A novel low cost process for the deposition of metallic and compound thin films on plastics," Surf. Coat. Technol. vol. 98, no. 1-3, pp. 1116-1120, Jan. 1998.
7. F. Paschen, Ann. Phys., vol. 50, p. 901, 1916.
8. F. Paschen, Ann. Phys., vol. 71, p. 537, 1923.
9. B. I. Moskalev, Hollow Cathode Discharge. Moscow, Russia: Energia, p. 1069. in Russian.
10. S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, and F. Milde, "Pulsed magnetron sputter technology," Surf. Coat. Technol. vol. 61, no. 1-3, pp. 331-337, Dec. 1993.
11. R. Scholl, "A new method of handling Arc and reducing particulates in DC plasma processing," in Proc. 36th Annu. Tech. Conf. Society of Vacuum Coaters, Dallas, TX, 1993, p. 405.
12. 3 with high rate pulsed reactive magnetron sputtering," Surf. Coat. Technol., vol. 59, no. 1-3, pp. 177-182, Oct. 1993.
13. 3," Surf. Coat. Technol. vol. 108-109, no. 1-3, pp. 558-563, Oct. 1998.
14. P. J. Kelly and R. D. Arnell, "Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering system," J. Vac. Sci. Technol. A, Vac Surf. Films, vol. 16, no. 5, pp. 2858-2869, Sep. 1998.
15. C. Paduraru, A. Belkind, K. Becker, J. Lopez, A. Delahoy, and S. Y. Guo, "Pulsed DC, gas-flow hollow cathode discharge: A source for sputter-deposition," in Proc. 46th Annu. Tech. Conf. Society of Vacuum Coaters, 2003, p. 56.
16. N. Hershkowitz, "Plasma diagnostics," vol. 1, Discharge Parameters and Chemistry. O. Aucciello, and D. Flamm, Eds. Orlando, FL: Academic, 1989, p. 113.
17. F. F. Chen, Plasma Diagnostic Techniques, R. H. Huddlestone and S. L. Leonard, Eds. New York: Academic, 1965, p. 113.
18. E. Badareu, C. Popovici, and M. Somesan, Z. Phys. Chem., vol. 320, p. 90, 1966.
19. A. Freilich, "Pulsed DC reactive magnetron sputtering of dielectrics," Ph.D. dissertation, Stevens Inst. Technol., Hoboken, NJ, 2004.
20. A. Belkind, A. Freilich, J. Lopez, Z. Zhao, W. Zhu, and K. Becker, "Characterization of pulsed dc magnetron sputtering plasmas," New J. Phys., vol. 7, p. 90, 2005.
21. A. Anders, "Fundamentals of pulsed plasmas for materials processing," Surf. Coat. Technol., vol. 183, no. 2/3, pp. 301-311, May 2004.
22. J. Lopez, W. Zhu, A. Freilich, A. Belkind, and K. Becker, "Time-resolved optical emission spectroscopy of pulsed DC magnetron sputtering plasmas," J. Phys. D, Appl. Phys., vol. 38, no. 11, p. 1769, Jun. 2005.
23. 2 thin films," Plasma Sources Sci. Technol., vol. 15, no. 2, pp. S17-S25, May 2006.
24. J.W. Bradley, U. H. Backer, P. J. Kelly, and R. D. Arnell, "Time-resolved Langmuir probe measurements at the substrate position in a pulsed midfrequency DC magnetron plasma," Surf. Coat. Technol., vol. 135, no. 2/3, pp. 221-228, Jan. 2001.
25. J.W. Bradley, U. H. Backer, P. J. Kelly, and R. D. Arnell, "Space and time resolved Langmuir probe measurements in a 100 kHz pulsed rectangular magnetron system," Surf. Coat. Technol., vol. 142-144, pp. 337-341, Jul. 2001.
26. 2 thin films," Surf. Coat. Technol., vol. 174-175, pp. 909-913, Sep./Oct. 2003.
27. J. W. Bradley, H. Backer, Y. Aranda-Gonzalvo, P. J. Kelly, and R. D. Arnell, "The distribution of ion energies at the substrate in an asymetric bi-polar pulsed DC magnetron discharge," Plasma Sources Sci. Technol., vol. 11, no. 2, p. 165, 2004.