Generation of RF plasma assisted high power pulsed sputtering glow discharge without using a magnetic field

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 8-9, 2009, Pages 1701-1704

  Yukimura, Ken ^a   Ehiasarian, Arutiun P ^b  

^a DOSHISHA UNIVERSITY   (Japan)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

Glow discharge; High power impulse magnetron sputtering; High power pulsed sputtering; HIPIMS; HPPMS; HPPS; RF plasma

Indexed keywords

HIGH POWER IMPULSE MAGNETRON SPUTTERING; HIGH POWER PULSED SPUTTERING; HIPIMS; HPPMS; HPPS; RF PLASMA;

ARGON; ELECTRODES; GLOW DISCHARGES; IONIZATION OF GASES; MAGNETIC FIELDS; MAGNETRONS; PLASMA THEORY; WAVE PLASMA INTERACTIONS;

DC GENERATORS;

EID: 65249154934     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.01.110     Document Type: Article

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