Estimation of plasma density in after-glow region of RF burst plasma based on voltage-current characteristics

Surface and Coatings Technology

Volumn 186, Issue 1-2 SPEC. ISS., 2004, Pages 53-56

  Watanabe, Satoshi ^a   Tanaka, Takeshi ^a   Takagi, Toshinori ^a   Yukimura, Ken ^b  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

Author keywords

After glow region; Plasma density; Voltage current

Indexed keywords

ELECTRIC POTENTIAL; ION IMPLANTATION; PLASMA SHEATHS; PULSE MODULATION; TARGETS;

ION SHEATHS; PULSE MODULATOR CIRCUITS; SHEATH RESISTANCE; TARGET VOLTAGE;

PLASMA DENSITY;

PLASMA TREATMENT;

EID: 17644381936     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.009     Document Type: Article

References (4)

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3. Tanaka T Watanabe S Mizuno G Takagi T Yoshida M Horibe H Yukimura K Nucl. Instrum. Methods Phys. Res., B 26 2003 817-819
4. Tuszewski M Scheuer J.T Adler R.A Surf. Coat. Technol. 93 1997 203-208