Development of a synchrotron biaxial tensile device for in situ characterization of thin films mechanical response

Review of Scientific Instruments

Volumn 81, Issue 10, 2010, Pages

  Geandier, G ^a,b,c   Thiaudire D ^b   Randriamazaoro, R N ^c   Chiron, R ^c   Djaziri, S ^a   Lamongie, B ^a   Diot, Y ^a   Le Bourhis, E ^a   Renault, P O ^a   Goudeau, P ^a   Bouaffad, A ^b   Castelnau, O ^c   Faurie, D ^c   Hild, F ^d  

^a UNIVERSITÉ DE POITIERS   (France)

^b SYNCHROTRON SOLEIL   (France)

^c UNIVERSITÉ PARIS 13   (France)

^d Grande Voie des Vignes   (France)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED STRAIN; BEAM LINES; BIAXIAL TENSILE; COMPLIANT SUBSTRATES; DIGITAL IMAGE CORRELATION METHODS; IN-SITU CHARACTERIZATION; IN-SITU DIFFRACTION; MECHANICAL RESPONSE; POLYCRYSTALLINE FILM; STRAIN FIELDS; TECHNOLOGICAL CHALLENGES;

CORRELATION METHODS; DIFFRACTION; POLYIMIDES; STRAIN; SYNCHROTRONS; X RAY DIFFRACTION;

SUBSTRATES;

EID: 78149454642     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3488628     Document Type: Conference Paper

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