TEM analysis of (Ni,Fe)Si 2 precipitates in Si

Physica Status Solidi (A) Applications and Materials Science

Volumn 207, Issue 8, 2010, Pages 1832-1844

  Langkau, Sabine ^a   Wagner, Gerald ^a   Kloess, Gert ^a   Heuer, Matthias ^b  

^a UNIVERSITY OF LEIPZIG   (Germany)

^b CaliSolar Inc   (Germany)

Author keywords

Defects; Ion implantation; NiSi2; Precipitates; Silicides; Silicon; Transmission electron microscopy

Indexed keywords

AVERAGE VOLUME; EDX ANALYSIS; FE IMPURITY; HRTEM IMAGES; ION MILLING; IRON ATOMS; LOCAL DENSITY; MATRIX; METAL IMPURITIES; NI CONTENT; NISI2; SILICON GRAINS; SOLID-STATE DIFFUSION; TEM; TEM ANALYSIS; TRANSMISSION ELECTRON;

DEFECTS; DIFFUSION IN SOLIDS; IMPURITIES; ION IMPLANTATION; METAL ANALYSIS; ORE TREATMENT; SILICIDES; SPECIMEN PREPARATION; TRANSMISSION ELECTRON MICROSCOPY;

SILICON;

EID: 77957950505     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200925309     Document Type: Article

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