Co-precipitation of copper and nickel in crystalline silicon

Materials Science and Engineering: B

Volumn 159-160, Issue C, 2009, Pages 365-368

  Rudolf, C ^a   Saring, P ^a   Stolze, L ^a   Seibt, M ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Metal impurities; Metal silicide precipitates; Silicon; Ternary phase diagram; Transmission electron microscopy

Indexed keywords

COPPER; COPPER COMPOUNDS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NICKEL COMPOUNDS; PRECIPITATES; PRECIPITATION (CHEMICAL); SILICIDES; SILICON WAFERS;

CO-DOPING; CO-PRECIPITATION; COPPER PRECIPITATION; CRYSTALLINE SILICONS; METAL IMPURITIES; METAL SILICIDE; METAL SILICIDE PRECIPITATE; MOLEFRACTION; SILICIDE PRECIPITATE; TERNARY PHASE DIAGRAMS;

NICKEL;

EID: 67349105302     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.10.015     Document Type: Article

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